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UV led exposure machine optical exposure lighting system and UV led exposure machine

A technology of optical exposure and lighting system, which is applied in the field of exposure lighting of exposure machines, and can solve problems such as underexposure and overexposure

Active Publication Date: 2015-12-16
浙江欧视电科技有限公司
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  • Abstract
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AI Technical Summary

Problems solved by technology

[0004] Using LEDs for exposure, because LEDs have a way in which the luminous intensity changes with the change of the luminous angle, the arrangement of the LEDs may cause overexposure in places with strong light intensity and underexposure in places with low light intensity. To design the arrangement of LEDs to make the exposure uniform needs to be solved urgently

Method used

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  • UV led exposure machine optical exposure lighting system and UV led exposure machine
  • UV led exposure machine optical exposure lighting system and UV led exposure machine
  • UV led exposure machine optical exposure lighting system and UV led exposure machine

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Embodiment Construction

[0025] Below in conjunction with accompanying drawing, the present invention is further described:

[0026] see figure 1 and figure 2 , an optical exposure lighting system for an ultraviolet LED exposure machine, comprising at least one light source mounting plate, a collimating lens 2, and an exposure lighting matrix arranger 3 for fixing the distance between the collimating lens 2 and the light source on the light source mounting plate, the light source Multiple rows of equidistantly arranged ultraviolet LED light sources 1 are sequentially arranged on the mounting board, the distance between the centers of two adjacent ultraviolet LED light sources 1 in each row is A, and the centers of ultraviolet LED light sources 1 in the same column in two adjacent rows The distance is B, B=A / number of rows, and two adjacent ultraviolet LED light sources 1 are arranged equidistantly. When designing 5 rows, the distance between the center of the first UV LED light source 1 in the firs...

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PUM

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Abstract

The invention provides an ultraviolet LED exposure machine optical exposure illumination system and an ultraviolet LED exposure machine adopting the system. The system comprises at least one light source mounting plate, a collimation lens, and an exposure illumination matrix arrangement device used for fixing the distance of the collimation lens and the light sources on the light source mounting plate. Multiple rows of ultraviolet LED light sources are sequentially arranged with equal spaces on the light source mounting plate. A distance between centers of two adjacent ultraviolet LED light sources in each row is A, a distance between centers of ultraviolet LED light sources in adjacent rows and in a same column is B, and B=A / row number. Every two adjacent ultraviolet LED light sources are arranged with equal spaces. According to the invention, the improvement on exposure uniformity and the reduction of light source divergence angle are adopted as basis. Phenomena such as non-uniform line thickness, inconsistent resolution on an entire plate, or broken line caused by non-uniform irradiation of the optical exposure illumination system are avoided.

Description

technical field [0001] The invention relates to a technical improvement method for exposure lighting of an exposure machine, in particular to a method for approaching large-area uniform ultraviolet radiation exposure, which relates to an optical lighting system of an ultraviolet LED exposure machine and an ultraviolet LED exposure machine. Background technique [0002] Effective uniform irradiation area and exposure uniformity are two important technical indicators of UV exposure machine. Existing UV exposure machines have different uses, or have high exposure resolution and complex structures, low light efficiency utilization, high energy consumption, and high maintenance costs, making them increasingly urgent to be replaced in today's energy-saving and environmentally friendly environment. or improved equipment. [0003] Due to the uneven irradiance of the optical exposure lighting system, the thickness of the lines is uneven, the resolution of the entire board is inconsi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张方德王玉璋贺兴志李小明
Owner 浙江欧视电科技有限公司
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