Workpiece height measuring device and correcting method thereof

A technology for height measurement devices and workpieces, which is applied in the direction of measuring devices, exposure devices for photolithography, and optical devices, can solve the problems of inability to accurately calculate the amount of defocus, tilt, and restrictions, and achieve good process adaptability, Reduce the effect of the influence, weaken the effect of the influence

Active Publication Date: 2014-03-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

However, because the CCD is limited by resolution, it is impossible to accurately calculate the amount of defocus and tilt

Method used

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  • Workpiece height measuring device and correcting method thereof
  • Workpiece height measuring device and correcting method thereof
  • Workpiece height measuring device and correcting method thereof

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Embodiment Construction

[0038] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0039] see figure 1 As shown, the workpiece height measuring device of the present invention is located between the projection objective lens 9 and the workpiece 22 in the scanning exposure equipment. The mask stage 3 is located above the projection objective lens 9 , the mask 21 with a pattern is placed on the mask stage 3 , and the workpiece 22 is placed on the workpiece stage 8 . The pattern of the mask 21 is projected onto the surface of the workpiece 22 through the projection objective lens 9 . The workpiece 22 may be a silicon wafer or a glass substrate.

[0040] The workpiece height measuring device includes a first linear array charge-coupled device (linear array CCD) 1, a first detection mirror group 2, a second linear array charge-coupled device 4, a second detection mirror group 5, a beam splitter 6, a mirror group 7, Projection ...

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PUM

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Abstract

The invention discloses a workpiece height measuring device and a correcting method thereof. The correcting method comprises the steps of splitting light rays irradiated by a light source into slit light beams through slits, carrying out oblique incidence into a workpiece to form an incidence light beam, then into a measurement light spot to form a reflection light beam through refection of the workpiece and form parallel light beams through a reflection mirror group; splitting the parallel light beams into a first measurement light beam and a second measurement light beam by a beam splitter mirror; receiving the first measurement light beam and the second measurement light beam by a first linear array charge-coupled device and a second linear array charge-coupled device after respectively passing through a first detection mirror group and a second detection mirror group. When a workpiece is positioned in a zero position, a first image and a second image are spliced, the zero position spacing between sub light spots is calculated; when the workpiece is out of focus, the obtained first image and the obtained second image are spliced, the out-of-focus spacing of the sub light spots is calculated; the displacement of each sub light spot is calculated according to the zero position spacing and the out-of-focus spacing of the sub light spots, and an average value of the displacements is used as a light spot displacement average value to calculate an out-of-focus amount of the workpiece. The workpiece height measuring device is high in measurement precision and strong in technological adaptability.

Description

technical field [0001] The invention relates to the field of object height measurement and correction, in particular to a device for measuring the height of a workpiece by light and a correction method thereof. Background technique [0002] The exposure device is a device that projects the pattern on the mask onto the surface of the workpiece through the projection objective lens. In projection exposure equipment, factors such as workpiece thickness deviation, surface undulation, and inaccuracy and non-repeatability of the focal plane position of the projection objective lens will cause defocus or inclination of the workpiece relative to the focal plane. If the defocus or inclination of the workpiece Making certain areas in the exposure field of view outside the effective depth of focus will seriously affect the measurement accuracy. [0003] U.S. Patent US5118957 proposes a non-contact photoelectric measurement technology. This technology uses the light beam emitted by a h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G01B11/02
Inventor 程琦陈飞彪
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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