One-time etch first and then plate metal frame subtractive embedded chip front-mount bump structure and process method
A technology of bump structure and metal plating, which is applied in the direction of electrical components, electric solid devices, circuits, etc., can solve the problems of lack of system functions in metal lead frames, and achieve the effects of improving heat dissipation, small size, and reducing costs
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[0063] The process method of the present invention for one-time etching and then plating metal frame subtractive buried chip front mounting bump structure is as follows:
[0064] Step one, take the metal substrate
[0065] See figure 1 , Take a piece of metal substrate with appropriate thickness, the material of this plate is mainly metal material, and the material of metal material can be copper, iron, galvanized, stainless steel, aluminum or metal that can achieve conductive function For materials or non-metallic materials, the thickness can be selected according to product characteristics.
[0066] Step two, paste photoresist film operation
[0067] See figure 2 Attach a photoresist film that can be exposed and developed on the front and back of the metal substrate to protect the subsequent etching process. The photoresist film can be a dry photoresist film or a wet photoresist film.
[0068] Step 3: Remove part of the photoresist film from the surface of the metal substrate
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