Secondary first plating and then etching metal frame subtraction embedded chip positive bump structure and process method
A technology of first plating and then etching, bump structure, applied in electrical components, electric solid devices, circuits, etc., can solve the problem of lack of system functions of metal lead frames, improve heat dissipation, reduce costs, and avoid signal transmission.
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[0080] see Figure 22 , the present invention is a metal frame subtractive embedded chip bump structure after secondary plating, which includes a metal substrate frame 1, a base island 2 and pins 3 are arranged inside the metal substrate frame 1, and the pins 3 In a stepped shape, the front of the base island 2 and the pin 3 are flush with the front of the metal substrate frame 1, the back of the pin 3 is flush with the back of the metal substrate frame 1, and the back of the base island 2 is flush with the pin 3 is flush with the stepped surface, the stepped surface of the pin 3 is provided with a metal layer 4, the back of the base island 2 is equipped with a chip 6 through a conductive or non-conductive adhesive substance 5, and the surface of the chip 6 is connected to the metal layer. The surfaces of 4 are connected by metal wires 7, and the inner area of the metal substrate frame 1 is filled with a molding compound 8, the front of the molding compound 8 is flush with t...
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