Composite electronic component of film capacitor and zener diode and manufacturing method thereof
A technology of composite electronic components and zener diodes, which is applied in semiconductor/solid-state device manufacturing, capacitors, electrical components, etc., and can solve problems such as functional degradation, incomplete function, and oxidation of electrode materials of zener diodes
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no. 1 Embodiment approach
[0043] Figure 1~4 The composite electronic component 100 of the film capacitor and the Zener diode according to the first embodiment of the present invention is shown. but, figure 1 It is a plan view of the composite electronic component 100. figure 2 Yes means figure 1 A cross-sectional view of the composite electronic component 100 in the XX part. image 3 Yes means figure 1 A cross-sectional view of the composite electronic component 100 in the YY part. Figure 4 It is an equivalent circuit diagram of the composite electronic component 100.
[0044] The composite electronic component 100 includes a p-type Si single crystal substrate 1. As the p-type Si single crystal substrate 1, for example, B doped with a carrier concentration of 5E16cm is used -3 Of the substrate.
[0045] A first SiO is formed on the p-type Si single crystal substrate 1 2 Layer 2. First SiO 2 The layer 2 is formed by, for example, a thermal oxidation method.
[0046] Thin film capacitors 8 and Zener diodes...
no. 2 Embodiment approach
[0084] in Figure 14 Of (A), (B), Figure 15 The composite electronic component 200 of the film capacitor and the Zener diode according to the second embodiment of the present invention is shown. Figure 14 (A) and (B) represent different cross-sections of the composite electronic component 200, respectively. Figure 15 It is an equivalent circuit diagram of the composite electronic component 200.
[0085] In the composite electronic component 100 according to the above-mentioned first embodiment, a B-doped, carrier concentration of 5E16cm is used. -3 However, in the composite electronic component 200 according to the second embodiment, a P-doped, carrier concentration of 2E16cm is used instead of this. -3 Constituted n-type Si single crystal substrate 31.
[0086] In addition, in the composite electronic component 100 according to the first embodiment described above, the n-type ZnO semiconductor thin film is used as the semiconductor thin film layer 13, but in the composite electro...
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Abstract
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