Composite electronic component having thin-film capacitor and zener diode, and manufacturing method for such composite electronic component
A composite electronic component, Zener diode technology, applied in semiconductor/solid-state device manufacturing, capacitors, electrical components, etc., can solve the problems of diffusion, insufficiency, high cost, etc.
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no. 1 Embodiment approach
[0043] Figure 1~4 A composite electronic component 100 of a film capacitor and a Zener diode according to the first embodiment of the present invention is shown. but, figure 1 is a plan view of the composite electronic component 100 . figure 2 yes means figure 1 A cross-sectional view of the composite electronic component 100 of the XX part. image 3 yes means figure 1 A cross-sectional view of the composite electronic component 100 in the Y-Y portion of . Figure 4 is an equivalent circuit diagram of the composite electronic component 100 .
[0044] The composite electronic component 100 includes a p-type Si single crystal substrate 1 . As the p-type Si single crystal substrate 1, for example, a B-doped substrate with a carrier concentration of 5E16 cm -3 the substrate.
[0045] A first SiO is formed on a p-type Si single crystal substrate 1 2 Layer 2. First SiO 2 Layer 2 is formed, for example, by thermal oxidation.
[0046] A thin film capacitor 8 and a Zener ...
no. 2 Embodiment approach
[0084] exist Figure 14 (A), (B), Figure 15 A composite electronic component 200 of a film capacitor and a Zener diode according to the second embodiment of the present invention is shown. Figure 14 (A) and (B) respectively show different cross-sections of the composite electronic component 200 . Figure 15 is an equivalent circuit diagram of the composite electronic component 200 .
[0085] In the above-mentioned composite electronic component 100 according to the first embodiment, a B-doped electronic component with a carrier concentration of 5E16cm is used. -3 p-type Si single crystal substrate 1, but in the composite electronic component 200 according to the second embodiment, instead of this, a p-type Si single crystal substrate 1 with a carrier concentration of 2E16cm is used. -3 An n-type Si single crystal substrate 31 is formed.
[0086] In addition, in the composite electronic component 100 according to the above-mentioned first embodiment, the n-type ZnO semico...
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Abstract
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