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Array substrate, manufacturing method thereof, and display panel

A technology of an array substrate and a manufacturing method, applied in the field of display panels, can solve problems affecting product quality and the like

Active Publication Date: 2017-02-15
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] In the above-mentioned process of forming the pixel electrode 9, when the ITO film is etched, it is easy to produce etching residues 10 (such as Figure 5 As shown), the phenomenon of interconnection between the pixel electrodes 9 is generated, which affects the product quality

Method used

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  • Array substrate, manufacturing method thereof, and display panel
  • Array substrate, manufacturing method thereof, and display panel
  • Array substrate, manufacturing method thereof, and display panel

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specific Embodiment approach

[0064] In the present invention, the strip electrodes may be pixel electrodes or common electrodes. As a specific embodiment of the present invention, the strip electrodes are pixel electrodes 9 .

[0065] When the strip electrode is a pixel electrode 9, in order to connect the pixel electrode 9 to the drain electrode 5 of the thin film transistor, a via hole can be formed on the insulating layer 7 to expose a part of the drain electrode 6 so as to be connected to the pixel electrode 9. connected. The strip-shaped electrode area of ​​the insulating layer 7 may include a via sub-area for forming a via 8, and the step S32 may include:

[0066] S321, exposing and developing the photoresist, so that the thickness of the photoresist in the interval region after development is greater than the thickness of the photoresist in the strip electrode region, and remove the photoresist in the via hole region (Such as Figure 7 shown);

[0067] S323, ashing the photoresist to remove the ...

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Abstract

The present invention provides an array substrate, a manufacturing method thereof, and a display panel. The array substrate includes a plurality of thin film transistors. The manufacturing method of the array substrate includes: S1, providing a substrate on which sources of the thin film transistors are formed. electrode and drain; S2, forming an insulating layer on the substrate, the insulating layer includes a spacer region and a plurality of strip-shaped electrode regions, and the spacer region separates any two adjacent strip-shaped electrode regions ; S3, forming a spacer layer above the spacer region of the insulating layer; S4, forming a pattern including strip electrodes above the strip electrode region of the insulating layer; S5, peeling off the spacer layer above the spacer region . The invention can prevent the phenomenon of interconnection between strip electrodes due to etching residues, and further improve product characteristics.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to a method for manufacturing an array substrate, an array substrate obtained by the method, and a display panel including the array substrate. Background technique [0002] At present, the array substrate of Thin Film Transistor Liquid Crystal Display (TFT-LCD) is completed through multiple patterning processes, wherein each patterning process includes: photoresist coating, exposure, development, etching and stripping processes. [0003] Generally, the fabrication of the array substrate can be completed through four, five or six patterning processes. The method for forming the array substrate through five patterning processes includes: [0004] First, gate metal is deposited on the substrate 1, and the pattern of the gate 2 is formed through the first patterning process, such as figure 1 shown; [0005] Secondly, deposit an insulating material (SiNx) to isolate th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/12
CPCH01L27/1248H01L27/1259H01L27/124H01L27/127
Inventor 张鹏举赵雨高紫龙
Owner BOE TECH GRP CO LTD