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96results about How to "Avoid interconnection" patented technology

Silicon carbide powder and preparation method thereof

The invention specifically relates to silicon carbide powder and a preparation method thereof. According to a technical scheme, the preparation method comprises the following steps of: uniformly mixing 5-20 percent by weight of nano-silicon dioxide or silica micro-powder, 0.5-2.5 percent by weight of carbon black or amorphous graphite powder, 70-88 percent by weight of an alkali metal chloride and 5-15 percent by weight of aluminum powder serving as raw materials; putting the uniformly-mixed raw materials into a tubular electric furnace, raising the temperature to 800-1,000 DEG C at the temperature raising rate of 4-10 DEG C per minute under the atmosphere of argon, and preserving heat for 2-10 hours; and putting an obtained product into nitric acid of which the concentration is 2-5 mol/L for soaking for 3-8 hours, filtering, cleaning with deionized water till the pH value of a cleaning solution is 7.0, and drying at the temperature of 110 DEG C for 8-24 hours to obtain silicon carbide powder. The method has the characteristics of low reaction temperature, simple process, controllable synthesis process, low production cost, and the like; and the prepared silicon carbide powder has the characteristics of high crystallization, high product purity, freeness from an impure phase and powder particle size of 50-200 nanometers.
Owner:WUHAN UNIV OF SCI & TECH

Prefabricated house building and construction method thereof

The invention relates to the technical field of house construction, in particularly to a prefabricated house building and a construction method thereof. According to key points of the technical scheme, a plurality of positioning columns are arranged at the top of a base, first limiting structures are arranged between positioning holes and the positioning columns, second limiting structures are arranged between supporting columns and the positioning columns, wallboards are arranged between the supporting columns, mounting structures are arranged between the wallboards and the supporting columns, first cross beams and second cross beams are arranged at the tops of the supporting columns, the two ends of the first cross beams are connected with first matching ends, the two ends of the secondcross beams are connected with second matching ends, third limiting structures are arranged between the first cross beams and the supporting columns, fourth limiting structures are arranged between the first matching ends and the second matching ends, a roof is arranged at the tops of the first cross beams and the tops of the second cross beams, and fifth limiting structures are arranged between the roof and the first cross beams. The prefabricated house building has the advantages of being convenient to install, high in efficiency and low in cost.
Owner:广东锦恒建筑有限公司

Continuous vertical hot evaporation metal film coating method

The invention discloses a novel continuous vertical hot evaporation metal film coating method. Metal film materials are coated on samples above a hot evaporation source in a vapor deposition way through a hot evaporation source at the bottom. The invention is characterized in that a slit type straightening device is arranged between the hot evaporation source and a sample conveying mechanism, divergent metal molecules sent from the hot evaporation source are filtered, and metal molecule flows vertically facing substrate materials of samples are formed, wherein the depth-to-width ratio of the slit of the straightening device is smaller than a half of the depth-to-width ratio of a surface relief sculpture structure of the substrate materials of the samples. In the application and the implementation of the invention, only the metal molecules flying approximately in the vertical direction are allowed to be deposited on the surface of substrate materials, so the invention is favorable for reducing or eliminating the side wall deposition of the surface relief sculpture structure on substrate materials, avoids the interconnection of the top of the relief sculpture structure and metal films at the bottom, and enhances double-layer metal wire grating structures required by the metal wire grating formation polarization technology.
Owner:SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI

Semiconductor structure and forming method thereof

The invention discloses a semiconductor structure and a forming method thereof. The forming method comprises the steps of providing a substrate, and forming a to-be-etched layer on the substrate, forming a core layer and a plurality of sacrificial layers located in the core layer on the to-be-etched layer, and enabling the sacrificial layers to be arranged at intervals, removing part of the core layer between the adjacent sacrificial layers to form a first groove penetrating through the core layer, and exposing the sacrificial layers from the side wall of the first groove, carrying out first ion doping treatment on the core layer of the side wall of the first groove, wherein the first ion doping treatment is suitable for increasing the etching resistance of the core layer of the side wall of the first groove, forming a side wall on the side wall of the first groove, after first ion doping processing and side wall forming are carried out, removing the sacrificial layer, forming a second groove penetrating through the core layer, and isolating the second groove and the first groove by a side wall, and etching the to-be-etched layers at the bottoms of the first groove and the second groove by taking the core layer and the side walls as masks. According to the embodiment of the invention, the probability that the core layer on the side wall of the first groove is mistakenly etched in the step of removing the sacrificial layer is reduced.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Self-feedback stratum information and multi-time repairing anchoring structure and anchoring and repairing method

The invention discloses a self-feedback stratum information and multi-time repairing anchoring structure and an anchoring and repairing method. The self-feedback stratum information and multi-time repairing anchoring structure comprises a hollow anchor rod, wherein the bottom of an anchoring section of the anchor rod is fixedly connected with a circular base plate; a plurality of annular fixing rings are arranged on a rod body of the anchor rod at intervals in a sleeving mode; a plurality of third circular holes are formed in the fixing rings; a free section of the anchor rod penetrates through a porous arched base plate; the porous arched base plate is fixed to the rock wall surface; pipes penetrate through the third circular holes and second circular holes in the same axis correspondingly; a rubber film column is installed in each pipe; the rubber film columns are filled with gas; anchor holes are filled with slurry injected through the anchor rod and solidified; the outer walls of the rubber film columns make close contact with the solidified slurry after the pipes are pulled out; and pressure sensors are installed inside the rubber film columns and are in signal connection witha controller. According to the self-feedback stratum information and multi-time repairing anchoring structure and the anchoring and repairing method, the anchoring structure and a stratum are linked,stratum deformation information can be automatically fed back, later repairing of the stratum through the anchoring structure is facilitated, the structure is simple, and multi-time repairing can beachieved.
Owner:CHANGSHA UNIVERSITY OF SCIENCE AND TECHNOLOGY
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