Single-phase alpha-Si3N4 micropowder and preparation method thereof
An ultrafine powder, single-phase technology, which is applied in the field of single-phase α-Si3N4 ultrafine powder and its preparation, can solve the problems of uneven particle size distribution, complicated process, and low degree of industrialization of powder, and achieve The process is easy to control, the synthesis process is simple, and the effect of low reaction temperature
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Embodiment 1
[0028] A single-phase α-Si 3 N 4 Ultrafine powder and its preparation method. First mix 10-20wt% elemental silicon powder, 15-30wt% solid nitrogen source and 60-75wt% halide powder to prepare a mixture; The heating rate was raised to 1200-1300°C at a rate of 2-5°C / min, and the temperature was kept for 2-4 hours; then the obtained product was repeatedly washed with deionized water until it was washed with AgNO 3 and Ca(NO 3 ) 2 Titrate the solution until no white precipitate appears; finally dry at 110°C for 10-24 hours to obtain single-phase α-Si 3 N 4 Ultrafine powder.
[0029]In this embodiment: the solid nitrogen source is melamine; the halide powder is a mixture of 70-90 wt% sodium chloride and 10-30 wt% sodium fluoride.
[0030] figure 1 It is a kind of single-phase α-Si prepared by the embodiment 3 N 4 XRD pattern of powder; figure 2 yes figure 1 The single-phase α-Si shown 3 N 4 SEM image of powder; image 3 yes figure 2 The EDS map of the location ind...
Embodiment 2
[0032] A single-phase α-Si 3 N 4 Ultrafine powder and its preparation method. First mix 10-20wt% elemental silicon powder, 15-30wt% solid nitrogen source and 60-75wt% halide powder to prepare a mixture; The temperature was raised to 1100-1200°C at a rate of 2-5°C / min, and kept for 2-4 hours; then the obtained product was repeatedly washed with deionized water until it was washed with AgNO 3 and Ca(NO 3 ) 2 Titrate the solution until no white precipitate appears; finally dry at 110°C for 10-24 hours to obtain single-phase α-Si 3 N 4 Ultrafine powder.
[0033] In this embodiment: the solid nitrogen source is a mixture of 50-70 wt% melamine and 30-50 wt% ammonium chloride; the halide powder is sodium fluoride.
[0034] The single-phase α-Si prepared in this example 3 N 4 The ultrafine powder has high purity, no particle agglomeration, and the particle size is 150-250nm.
Embodiment 3
[0036] A single-phase α-Si 3 N 4 Ultrafine powder and its preparation method. Firstly mix 5-15wt% elemental silicon powder, 10-25wt% solid nitrogen source and 70-80wt% halide powder to make a mixture; The heating rate was raised to 1000-1100°C at a rate of 5-10°C / min, and the temperature was kept for 4-6 hours; then the obtained product was washed repeatedly with deionized water until it was washed with AgNO 3 and Ca(NO 3 ) 2 Titrate the solution until no white precipitate appears; finally dry at 110°C for 10-24 hours to obtain single-phase α-Si 3 N 4 Ultrafine powder.
[0037] In this embodiment: the solid nitrogen source is urea; the halide powder is potassium fluoride.
[0038] The single-phase α-Si prepared in this example 3 N 4 The ultrafine powder has high purity, no particle agglomeration, and the particle size is 300-400nm.
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