Unlock instant, AI-driven research and patent intelligence for your innovation.

Mask plate and exposure method

An exposure method and mask technology, applied in the field of mask and exposure, can solve the problems of high cost, poor competitiveness, and many masks of liquid crystal displays, so as to improve competitiveness, increase production capacity, and reduce the number of use. Effect

Active Publication Date: 2014-11-26
BOE TECH GRP CO LTD +1
View PDF6 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The inventors have found that in the prior art, the light-shielding pattern and the light-transmitting pattern on one mask are fixed, therefore, only one layer of structure can be formed by using one mask, so that in the manufacturing process of the liquid crystal display, it is necessary to The number of masks used is large, resulting in high cost, low production capacity and poor competitiveness of liquid crystal displays

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate and exposure method
  • Mask plate and exposure method
  • Mask plate and exposure method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] An embodiment of the present invention provides a mask, and a multi-layer structure can be formed by using the mask.

[0040] Specifically, the mask includes at least two superimposed sub-masks, each sub-mask includes a light-shielding pattern and a light-transmitting pattern, and vertical projections of all the light-shielding patterns on the mask have no overlap. Exemplarily, as figure 1 As shown, the mask includes two first sub-masks 1 and second sub-masks 2 arranged up and down, wherein the first sub-mask 1 includes light-shielding patterns 11 and light-transmitting patterns 12, and the second sub-masks 1 The mask plate 2 includes light-shielding patterns 21 and light-transmitting patterns 22 .

[0041] It should be noted that the above-mentioned word "superposition" only defines the upper-lower relationship of multiple sub-masks, and does not limit other features. Multiple sub-masks can be actually independent of each other, or can be a mask A plurality of sub-ma...

Embodiment 2

[0052] An embodiment of the present invention provides an exposure method, the exposure method includes at least two exposure processes, each exposure process includes: Figure 5 Steps shown:

[0053] Step S501 , forming a photoresist on the substrate.

[0054] The photoresist can be formed on the substrate by methods such as spin coating. It should be noted that if the photoresist is used to protect the underlying film layer from being etched, the photoresist should be formed on the substrate before forming the photoresist on the substrate. A corresponding film layer is formed on it.

[0055] Step S502, using a mask plate to cover the substrate formed with photoresist, the mask plate includes at least two superimposed sub-mask plates, each sub-mask plate includes a light-shielding pattern and a light-transmitting pattern, and all the light-shielding patterns are on the mask plate Vertical projections on , have no overlap.

[0056] Step S503 , focusing the exposure light on...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the invention discloses a mask plate and an exposure method and relates to the technical field of display. By adopting the mask plate, a multilayer structure can be formed. The mask plate comprises at least two overlapped sub-mask plates, wherein each sub-mask plate comprises shielding patterns and light transmitting patterns; and the vertical projections of all the shielding patterns on the mask plate are not overlapped.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate and an exposure method. Background technique [0002] During the manufacturing process of the liquid crystal display, multiple patterning processes are required to form each layer structure. Generally, the patterning process includes steps such as coating photoresist, covering with a mask, exposing, developing, etching, and stripping photoresist. [0003] Specifically, the mask includes a light-shielding pattern and a light-transmitting pattern. For example, when the photoresist coated on the substrate in the patterning process is a positive photoresist, during the exposure process, the light-shielding pattern on the mask blocks Block the light, so that the photoresist under the light-shielding pattern is not irradiated by light, and the photoresist is not denatured, and is retained in the subsequent development process. The light-transmitting pattern on the mask p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F1/00G03F7/20
Inventor 王宝强朴相镇
Owner BOE TECH GRP CO LTD