Unlock instant, AI-driven research and patent intelligence for your innovation.

Transparent substrate monitoring apparatus and transparent substrate monitoring method

A technology of transparent substrates and monitoring devices, applied in measuring devices, optical devices, instruments, etc., can solve problems such as substrate warpage and difficulty in measuring substrate thickness

Active Publication Date: 2014-12-10
KOREA RES INST OF STANDARDS & SCI
View PDF8 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, large area substrates may cause the substrate to warp during substrate thickness measurement
Depending on the degree of substrate warpage, the path of light reflected from the substrate changes, making it difficult to accurately measure substrate thickness

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Transparent substrate monitoring apparatus and transparent substrate monitoring method
  • Transparent substrate monitoring apparatus and transparent substrate monitoring method
  • Transparent substrate monitoring apparatus and transparent substrate monitoring method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0065] According to an embodiment of the present invention, if the thickness of the transparent substrate is not uniform, the optical path length of light passing through the transparent substrate varies. Therefore, phase differences of light passing through the glass occur at respective positions. To measure the phase difference, the light beams emitted from the light source are converted into parallel lights and passed through a transparent substrate. The light beam passing through the transparent substrate hits the double slit with a slit interval "a". Light passing through the double slit is diffracted to form interference fringes on the screen plane on which the optical detection unit is arranged. If there is no phase difference caused by the individual optical paths of the double slit, the maximum peak of the interference fringes is located at the center of the double slit. If there is a phase difference caused by the respective optical paths of the double slits, the m...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Provided are a transparent substrate monitoring apparatus and a transparent substrate monitoring method. The transparent substrate monitoring apparatus includes a light emitting unit emitting light; a double slit disposed on a plane defined in a first direction and a second direction intersecting a propagation direction of incident light and includes a first slit and a second slit spaced apart from each other in the first direction to allow the light to pass therethrough; an optical detection unit measuring an intensity profile or position of an interference pattern formed on a screen plane; and a signal processing unit receiving a signal from the optical detection unit to calculate an optical phase difference or an optical path difference.

Description

technical field [0001] The present invention relates to a thickness change measuring device and a thickness change measuring method, more particularly, to a thickness change measuring device and a thickness change measuring method capable of accurately measuring thickness changes using double slits. [0002] The present invention also relates to a transparent substrate monitoring device and a transparent substrate monitoring method, more specifically, to a transparent substrate monitoring device and a transparent substrate monitoring method capable of accurately monitoring changes in optical path difference using double slits. Background technique [0003] A substrate made of glass or the like is used for a flat panel display device such as a liquid crystal display (LCD) or an organic light emitting diode (OLED) display device. With the recent trend toward larger-area and higher-resolution display devices, the area of ​​substrates included in display devices has become large...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06G01B9/02
CPCG01B11/0691
Inventor 金在完金钟安陈宗汉姜宙植严泰凤
Owner KOREA RES INST OF STANDARDS & SCI