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Strong laser vortex mirror

A mirror, strong laser technology, applied in the field of inertial confinement super vortex laser, can solve the problems of affecting laser energy absorption, poor laser targeting effect, etc., and achieve the effect of high-efficiency conversion

Active Publication Date: 2017-04-05
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

However, with the further increase of laser energy, the plasma cloud forms a strong shielding effect on the metal surface, thus affecting the further absorption of laser energy
The focused laser center drifts and diffuses with the axial propagation of the focal point due to the strong plasma cloud shielding effect, which makes the laser targeting effect worse

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Embodiment Construction

[0015] Such as figure 1 As shown, the number of steps of the strong laser vortex reflector is N=8, that is figure 1 The middle elliptical area is divided into 8 sectors, and the etching depth corresponding to each sector is sequentially numbered as follows: The corresponding phase delays are π / 4, π / 2, 3π / 4, π, 5π / 4, 3π / 2, 7π / 4, 2π. For the working wavelength of 800nm, the etching depth of each step is 35nm, 70nm, 105nm, 140nm, 175nm, 210nm, 245nm, 280nm in sequence. In this embodiment, this multi-sector and multi-step microstructure is processed on an optical glass or fused silica substrate by photolithography. In order to make full use of the effective lithography area of ​​the lithography machine, in this embodiment, the four corners of the rectangular substrate are cut off to form an octagonal substrate. Cut-off dimensions are designed as figure 1 marked in , where the length and width of the original rectangular substrate are and a, so the maximum clear aperture...

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Abstract

The invention provides an intense laser vortex reflector. The intense laser vortex reflector is characterized in that the microstructure of N steps of N sector regions is etched on an optical glass substrate or a fused quartz substrate through a photoetching method, the etching depth corresponding to the nth step is shown in the specification, wherein l is the topological loads of vortexes carried by the intense laser vortex reflector; n=1, 2,..., N, N is a high-order power value of 2, and for example, N=4 or 8 or 16 or 32. The microstructure is plated with a 45-degree incident medium reflection film with high efficiency and the high damage threshold, and the intense laser vortex reflector is formed; after being reflected by the vortex reflector, 45-degree incident intense lasers are changed into 45-degree emergent vortex intense lasers with the l topological loads. The super intense lasers with vortex phase wave front have important scientific research significance and potential practical value for inertial confinement nuclear fusion.

Description

technical field [0001] The invention relates to an inertial-constrained ultra-intensive vortex laser, in particular to an intense laser vortex reflector for generating an ultra-intensive vortex laser. Background technique [0002] Laser technology has been proposed to produce inertial confinement fusion since the invention of lasers in 1960. We know that the mode distribution of the laser light field is mainly determined by the laser resonator, which is the Hermitian Gaussian mode for the rectangular cavity mirror and the Laguerre Gaussian mode for the circular symmetric cavity mirror. In general, the Gaussian beam of the fundamental mode has smaller spatial localization and higher energy density, so the Gaussian beam of the general fundamental mode is widely used. For laser targeting, although the usual Gaussian laser can generate extremely high energy density, a strong plasma cloud is generated on the metal target surface. However, with the further increase of laser ener...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/08
CPCG02B5/08
Inventor 周常河余俊杰贾伟卢炎聪项长铖
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI