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Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner

A technology of magnetron sputtering and coating machine, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc. It can solve the problems of limited number of installations, influence of coating efficiency, long time required, etc., and achieve improvement Efficiency, flexible target change, and convenient control

Active Publication Date: 2015-05-13
常州常工院技术转移有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the cathode sputtering film-forming device, the winding-type vacuum coating equipment can obviously improve the film-forming efficiency because of its continuous production. However, in the existing winding-type vacuum coating equipment, for each The number of membrane cathode cells installed is limited, and the target material needs to be changed repeatedly for multi-layer dielectric film coating, and the vacuum needs to be pumped again after each target material change, which takes a long time and is cumbersome to operate, which seriously affects the coating efficiency and wastes a lot of energy ; In addition, the existing winding-type vacuum coating equipment often needs to be used in conjunction with cleaning devices, heating devices, unwinding and winding mechanisms to form a production line, which will cause a lot of equipment and occupy a large production area.

Method used

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  • Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner
  • Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner
  • Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner

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Embodiment

[0038] Such as figure 1 As shown, a magnetron sputtering roll-to-roll coating machine for rapid target-changing single-sided reciprocating continuous high-efficiency coating in this embodiment includes a vacuum chamber 1, an unwinding chamber 2, an unwinding mechanism 201 located in the unwinding chamber 2, and a winding chamber 9. The winding mechanism 901 arranged in the winding chamber 9 and the cold roller 8 arranged in the vacuum chamber 1 also include a deviation correction device 3, two or more turning target devices 10, and each turning The cathode chamber 11 with openings on both sides corresponding to the conversion target device 10 is provided with a gate valve 4 between the unwinding chamber 2 and the vacuum chamber 1, between the winding chamber 9 and the vacuum chamber 1, and is used to prevent the unwinding chamber 2 and the vacuum chamber 1. The gas in the winding chamber 9 enters the vacuum chamber 1 to avoid affecting the vacuum degree of the vacuum chamber 1...

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Abstract

The invention discloses a magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating a film in a single-surface reciprocating manner, belonging to the field of coating equipment. The magnetron-sputtering winding coating machine comprises a vacuum chamber, an uncoiling mechanism, a coiling mechanism, a cold roll, deviation correcting devices, two or more rotary target changing devices and negative electrode cells, wherein the negative electrode cells are formed corresponding to each rotary target changing device, openings are formed in the two sides of each negative electrode cell; a set of deviation correcting device is arranged at each of the uncoiling mechanism and the coiling mechanism; the negative electrode cells are distributed on the circumference, coated with a base band, of the cold roll, and each set of the deviation correcting device and the corresponding negative electrode cells are arranged on the same axis; the base band is driven to do a reciprocating motion by the uncoiling mechanism and the coiling mechanism. According to the magnetron-sputtering winding coating machine, a negative electrode target can be timely and rapidly replaced when the coating vacuum chamber is not opened, and multiple film layers can be coated by virtue of the reciprocating motion of base materials in a film coating process, so that the film coating efficiency is greatly improved; the magnetron-sputtering winding coating machine is particularly suitable for large-scale high-efficiency production.

Description

technical field [0001] The invention relates to a vacuum coating machine, more specifically, to a magnetron sputtering roll-to-roll coating machine for rapid target change, single-sided reciprocating continuous high-efficiency coating. Background technique [0002] Vacuum roll coating technology is a technology that prepares one or more layers of thin films with certain functions on the surface of the coil substrate by thermal evaporation or magnetron sputtering in a vacuum chamber. The vacuum winding coating equipment mainly has the following characteristics: first, the substrate to be coated is a flexible substrate, that is, it can be wound; second, the coating process is continuous, that is, the coating is carried out continuously within a working cycle; Third, the coating process is carried out in a high vacuum environment. During the unwinding and rewinding process of the winding coating machine, the surface of the substrate is coated with a thin film. The structure of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/56C23C14/35
Inventor 朱锡芳陈功徐安成许清泉杨辉
Owner 常州常工院技术转移有限公司
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