A laser dual-band high-reflection dielectric film and its preparation method
A high-reflection, dielectric film technology, used in optics, optical components, instruments, etc., to achieve the effect of small energy loss, improved performance, and less absorption
Active Publication Date: 2017-03-15
BEIJING RES INST OF TELEMETRY +1
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Problems solved by technology
However, this method can only guarantee high reflectivity for one band
The existing technology has not yet solved the technical problem that a reflective film realizes dual-band simultaneous high reflection of the 790nm-860nm band and the 1500nm-1650nm band
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[0020] Such as figure 1 Shown, a kind of laser dual-band highly reflective dielectric film, this highly reflective dielectric film comprises glass substrate and the optical film system that is attached on the glass substrate, and this optical film system is made of titanium dioxide (TiO 2 ) and silicon dioxide (SiO 2 ) are alternately stacked, titanium dioxide (TiO 2 ) to form titanium dioxide (TiO 2 ) layer, silicon dioxide (SiO 2 ) to form silicon dioxide (SiO 2 ) layer; the characteristic structure of this highly reflective dielectric film is |(HLH)^ 7 S|, where H represents titanium dioxide (TiO 2 ) layer, L represents silicon dioxide (SiO 2 ) layer, S represents the substrate; N represents the period number of (HLH), 7≤N≤100; each layer of titanium dioxide (TiO 2 ) layer thickness is 118.9nm, each layer of silicon dioxide (SiO 2 ) layer thickness is 188.3nm; titanium dioxide (TiO 2 ) layers have a refractive index of 2.271, silicon dioxide (SiO 2 ) layers have ...
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The invention relates to a laser dual-band highly-reflective dielectric film and a preparation method thereof, and belongs to the technical field of optical devices. The highly-reflective dielectric film comprises a substrate and an optical film system attached to the substrate. The optical film system is formed by alternately stacking titanium dioxide and silicon dioxide, and the feature structure is |(HLH)^<N>S|. The dual-band highly-reflective dielectric film of the invention is simple in design structure, the selected TiO2 film and SiO2 film materials are used in common, and the process is easy to realize. The dual-band highly-reflective dielectric film of the invention has the characteristic of high reflectivity for light in two bands, and the reflectivity is higher than 99.5% both for light in the 790-860nm band and light in the 1500-1650nm band. The reflectivity for light in other bands is low, and a certain filtering effect is achieved. The dual-band highly-reflective dielectric film of the invention further has the characteristics of less absorption of laser energy, low energy loss, stable optical performance, firm and reliable film layers, and the like.
Description
technical field [0001] The invention relates to a laser dual-band high-reflection dielectric film and a preparation method thereof, belonging to the technical field of optical devices. Background technique [0002] Laser has the characteristics of strong directionality, good monochromaticity, high brightness, and good coherence, and is more and more used in aerospace, military, and civilian fields. Especially in the field of aerospace, with the development of space laser communication technology and lidar technology, there is an urgent need for multiple light sources in the optical system to share the optical path and optical antenna. For example, in the above applications, typical optical systems generally use laser light sources in the 790nm-860nm band and 1500nm-1650nm band, so the same optical antenna is required to be highly reflective to the two laser bands, so as to achieve efficient transmission and reception of laser dual bands. At present, the method of metal coat...
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IPC IPC(8): G02B5/08G02B1/00
CPCG02B1/10G02B5/0816
Inventor 刘向南李英飞张靓谌明卢满宏于征
Owner BEIJING RES INST OF TELEMETRY