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Position measurement system, grating for a position measurement system and method

A measurement system and grating technology, applied in the direction of measurement devices, diffraction gratings, optics, etc., can solve problems such as inappropriate absolute position, high-precision measurement influence, etc.

Active Publication Date: 2015-07-22
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the presence of such local markings has a negative impact on high-accuracy measurements at locally marked areas
Therefore, such local markers are not suitable for determining absolute position in areas where high-precision measurements are required

Method used

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  • Position measurement system, grating for a position measurement system and method
  • Position measurement system, grating for a position measurement system and method
  • Position measurement system, grating for a position measurement system and method

Examples

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Embodiment Construction

[0026] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically depicted. The apparatus comprises an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or any other suitable radiation) and a support structure or patterning device support (e.g. mask table) MT , the support structure or patterning device support MT is configured to support the patterning device MA and is connected to a first positioning device PM configured to precisely position the patterning device according to certain parameters. The apparatus also includes a substrate table WT (e.g., a wafer table or substrate support) configured to hold a substrate (e.g., a resist-coated wafer) W and connected to a substrate configured to be precisely positioned according to certain parameters. Second positioning device PW of substrate W. The apparatus further comprises a projection system PS configured to project the pattern imparted t...

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Abstract

A grating for a position measurement system, the grating including a first array of grating lines in a first direction and a second array of grating lines in a second direction. The first and second arrays diffract a measurement beam incident on the first and second arrays in at least one first diffracted beam in the first direction and in at least one second diffracted beam in the second direction. The at least one first diffracted beam is used for position measurement in the first direction and the at least one second diffracted beam is used for position measurement in the second direction. The measurement beam has a power quantity, and the grating is configured to distribute the power quantity unevenly over the at least one first diffracted beam and the at least one second diffracted beam.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application 61 / 728,071, filed November 19, 2012, which is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a position measurement system, an optical grating for a position measurement system, and a method. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device (alternatively referred to as a mask or reticle) may be used to create the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, a portion comprising one or several dies) on a substrate (eg, a silicon wafer). The transfer of the pattern is usually via ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G01D5/347G03F7/20G02B5/18
CPCG03F9/7049G02B5/1861G03F7/70775G03F9/7088G01D5/38G01D5/34776G01D2205/90G03F7/70133G01D5/347G03F9/7076
Inventor W·H·G·A·凯南
Owner ASML NETHERLANDS BV