Anti-reflection anti-reflection transparent conductive film

Abstract

The invention discloses an antireflection and antireflection transparent conductive film, which includes a substrate, and the top surface of the substrate is sequentially provided with an upper silicon nitride oxide film layer and an upper SiO 2 film layer, the upper silicon oxynitride film layer and the upper SiO 2 The film layer constitutes a group of upper composite film layers, and at least one set of upper composite film layers is provided on the top surface of the substrate; the bottom surface of the substrate is provided with a lower silicon oxynitride film layer and a lower SiO 2 film layer, the lower silicon oxynitride film layer and the lower SiO 2 The film layer constitutes a set of lower composite film layers, and at least one set of lower composite film layers is arranged on the bottom surface of the substrate; the outer film surface of the upper composite film layer and / or the lower composite film layer is provided with an ITO layer; the molecular formula of the silicon oxynitride is SiN x o y , where x and y are the moles of nitrogen and oxygen respectively, 1≤x≤4 / 3, 0≤y≤1 / 3, x / y≥3; silicon nitride oxide film layer and SiO 2 The film layer uses the principle of optical interference and extinction to make the etched and unetched areas of the ITO layer have similar color values ​​under D65 light source conditions, and they are all neutral, reducing the influence of film thickness on the color change of the film system, making the extinction effect more effective It is easy to control and reduces the production cost.

Description

technical field [0001] The invention relates to the technical field of touch screens, in particular to an anti-reflection and anti-reflection transparent conductive film capable of eliminating the color difference between an etched area and an unetched area. Background technique [0002] The transparent conductive oxide film is the main component of the capacitive touch screen. The film is located in the display area and is generally etched from an ITO film. The refractive index of the conductive film is different from that of the touch screen substrate. The refractive index of the ITO film is generally 1.9-2.0. The refractive index of the touch screen substrate is about 1.5, resulting in a large difference between the visible light reflection and transmission spectra of the electrodes (ITO) and the electrode gaps in the display area, so that the electrodes and the gaps are clearly visible (color difference Δa * with Δb * greater than 1), and the color is not neutral (color...

AI Technical Summary

Problems solved by technology

In order to obtain an erasing film with an erasing effect that meets the requirements, the coating control process requirements for high-refractive index materials are very strict (for Nb 2 o 5 or TiO 2 The film thickness change is less than ±0.5nm), and the process is difficult; in addition, the metal and ceramic targets of Nb and Ti materials are relatively expensive, which also increases the manufacturing cost of the disappearing anti-reflection transparent conductive film

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