Substrate elevation pin and substrate processing device

Abstract

The invention relates to a substrate elevation pin installed on the upper part of the substrate support. The substrate elevation pin enables the upper part surface of the elevation pin to be closely contact with the lower part of the substrate through elastic support when the substrate is installed on the upper part of the substrate and is positioned inside the substrate support. As a result, the heat of the substrate support is effectively transmitted to the substrate on the upper part of the elevation pin to enable the substrate to maintain uniform temperature to prevent the membrane from being abnormal and producing strips.

Description

technical field [0001] The invention relates to a lifting pin for placing a substrate on the upper part of a substrate holder and a substrate processing device including the same. Background technique [0002] Recently, in order to reduce substrate processing steps and production costs, the size of the substrate 2 has become larger, so the number of lift pins 3 that can prevent the substrate 2 from sagging as much as possible has also increased. [0003] Generally speaking, such as Figure 1 to Figure 3 As shown, in the substrate processing process, the existing lifting pin 3 is inserted into the through opening provided in the substrate holder 1 as the substrate holder 1 moves up and down, so that it can move up and down relatively, and the substrate 2 can be placed on and removed from the substrate holder. 1 upper part. [0004] In order to prevent defects on the lower surface of the substrate 2 , after the lift pin 3 of the existing substrate processing device places the...

AI Technical Summary

Problems solved by technology

Therefore, a space 4 is generated between the lifting pin 3 and the substrate, causing the heat of the substrate holder 1 to be effectively transferred to the substrate 2 on the upper part of the lifting pin 3

Accordingly, a temperature difference occurs on the substrate 2, which affects the thickness and uniformity of the film quality.

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