Metal membrane containing metal membranes containing metal membranes with etching solution
A technology of composition and etching solution, which is applied in the field of etching solution composition for metal film, and can solve problems such as etching speed delay
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Embodiment 1 to 5 and comparative example 1
[0058] Examples 1 to 5 and Comparative Example 1. Manufacture of Etching Solution Composition for Metal Film
[0059] The etching liquid composition for metal films was manufactured using the components and content shown in Table 1 below.
[0060] The unit of content of each component in the following Table 1 is weight %, and the balance is water.
[0061] 【Table 1】
[0062] distinguish
APS
AF
HNO 3
ATZ
p-TSA
A.A.
AcOH
h 3 PO 3
Example 1
15
0.7
3
1.2
3.0
2.5
8.0
0.5
Example 2
15
0.7
3
1.2
3.0
2.5
8.0
0.8
Example 3
15
0.7
3
1.2
3.0
2.5
8.0
1.0
Example 4
15
0.7
3
1.2
3.0
2.5
8.0
1.2
Example 5
15
0.7
3
1.2
3.0
2.5
8.0
1.5
Comparative example 1
15
0.7
3
1.2
3.0
2.5
8.0
0
[0063] APS: Ammonium persulfate
[006...
experiment example 1
[0069] Experimental example 1. Measurement of etching rate and etching gradient
[0070] The experimental equipment of the spray etching method used a 0.5-generation etcher (Etcher) (AST Company). When performing the etching process, the temperature of the etching solution composition was about 26° C., and the etching time was about 100 to 130 seconds.
[0071] When measuring the cross-section of the etched copper-based double film in the above-mentioned etching process, the cross-section SEM (Hitachi (Hitachi) company product, model name S-4700) was used to measure, and in the following Table 2 and figure 1 The results are shown in .
[0072] 【Table 2】
[0073]
[0074] Such as figure 1 As shown in Table 2, it was confirmed that the etchant composition for a metal film containing phosphorous acid can adjust the inclination of the etching slope without delaying the etching rate.
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