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Method for manufacturing ozone-gas-dissolved water and cleaning method for electronic materials

A manufacturing method and technology for dissolving water, which can be used in cleaning methods using liquids, semiconductor/solid-state device manufacturing, chemical instruments and methods, etc., and can solve problems such as large sludge

Active Publication Date: 2015-10-21
KURITA WATER INDUSTRIES LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Through this waste liquid treatment, a large amount of sludge is generated

Method used

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  • Method for manufacturing ozone-gas-dissolved water and cleaning method for electronic materials
  • Method for manufacturing ozone-gas-dissolved water and cleaning method for electronic materials

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] according to figure 1 The shown ozone gas-dissolved water supply system performs production of ozone gas-dissolved water and washing of objects to be cleaned.

[0099] The apparatus used is described below.

[0100] Degassing membrane module: "Liqui-Cel G248 (リキセル G248)" manufactured by Polypore;

[0101] Gas-dissolving membrane module: "GNH-01R" manufactured by Japan GORE-TEX Company (Japango Artex Corporation);

[0102] Ozone generator: "GR-RB" manufactured by Sumitomo Precision Industries, Ltd.

[0103] As supply water (pure water), degassing treatment is performed in the degassing membrane module 1 , and water with a dissolved oxygen concentration of about 10 ppb is supplied to the gas-dissolving membrane module 3 . The water supply volume was set to 10 L / min (L / min), and the water temperature of the water supply and the place of use was set to 25°C. The amount of oxygen supplied to the ozone generator 5 was set at 280 NmL / min from the saturation solubility (sat...

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PUM

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Abstract

A method for producing ozone gas-dissolved water includes a process in which a mixed gas of an ozone gas and an oxygen gas and degassed water are supplied to an ozone-dissolving section and the mixed gas is dissolved in the degassed water. The amount of the mixed gas supplied to the ozone-dissolving section is controlled such that the sum of the dissolved oxygen gas concentration of the degassed water and the increment of the dissolved oxygen gas concentration calculated from the amount of the oxygen gas in the mixed gas and the amount of the degassed water on the assumption that ozone in the mixed gas entirely decomposes into oxygen is less than or equal to the saturated solubility of the oxygen gas under conditions using the obtained ozone gas-dissolved water.

Description

technical field [0001] The present invention relates to a method for producing ozone gas-dissolved water suitable for wet cleaning of electronic materials (electronic parts, electronic equipment, etc.) net method. Background technique [0002] In order to remove particles, organic substances, metals, etc. from the surface of electronic materials such as silicon substrates for semiconductors, glass substrates for flat panel displays, and quartz substrates for photomasks, the so-called RCA cleaning method is performed with hydrogen peroxide. Wet cleaning at high temperature with thick liquid based chemicals. The RCA cleaning method is an effective method for removing metals on the surface of electronic materials, but since a large amount of high-concentration acid, alkali or hydrogen peroxide is used, these chemicals are discharged into the waste liquid, and neutralization is required Or waste liquid treatment such as precipitation treatment. A large amount of sludge is pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/304B08B3/08
CPCH01L21/02052C02F1/20C02F1/78C02F2103/346
Inventor 床嶋裕人森田博志
Owner KURITA WATER INDUSTRIES LTD
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