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Device and manufacturing method for manufacturing silicon spherical micro-channel plate

A technology of silicon microchannel plate and manufacturing method, which is applied in the direction of manufacturing microstructure devices, microstructure devices, and techniques for producing decorative surface effects, and can solve the problems of short working life, harsh working environment, and microchannel plate manufacturing process. Complicated issues

Active Publication Date: 2015-11-04
EAST CHINA NORMAL UNIVERSITY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, there are only spherical micro-channel plates made of glass in China. The production process of this micro-channel plate is complicated, and there are problems such as short working life and harsh working environment.

Method used

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  • Device and manufacturing method for manufacturing silicon spherical micro-channel plate
  • Device and manufacturing method for manufacturing silicon spherical micro-channel plate
  • Device and manufacturing method for manufacturing silicon spherical micro-channel plate

Examples

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Embodiment

[0029] Embodiment: The planar silicon microchannel plate 1 that the sample adopts crystalline four-inch P-type silicon is made, and the mold table 2 adopts silicon material, and what the step hole adopts is circular. The specific production process is as follows:

[0030] Using the method provided by the patent application number 201110196442.4, and using the device provided by the patent application number 201120406111.4, a silicon microchannel plate was fabricated on a 4-inch silicon wafer, and each microchannel had a side length of 5 microns × 5 microns and a depth of 250 Micron, sidewall thickness 1 micron;

[0031] (1) Through laser cutting, obtain a wafer type silicon microchannel plate with a diameter of 16 mm;

[0032] (2) Wash the cut wafer-shaped silicon microchannel plate in No. 3 solution for 30 minutes, wash it in No. 1 solution for 10 minutes, and then rinse it in No. 2 solution for 10 minutes. Among them, No. 1 liquid is a certain proportion of H 2 o 2 and ...

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Abstract

The invention discloses a device and a manufacturing method for manufacturing a silicon spherical micro-channel plate. The device comprises the silicon micro-channel plate which is cut into round. The silicon micro-channel plate is placed in a mould platform. A stepped hole whose size is matched with that of the silicon micro-channel plate is arranged at the centre of the mould platform. The silicon micro-channel plate is arranged in the stepped hole. A weight piece is arranged on the mould platform. The stepped hole is completely covered by the weight piece; the mould platform is placed in a quartz frame. The quartz frame, the mould platform, the weight piece and the silicon micro-channel plate are placed in an oxidizing furnace tube. The device and the manufacturing method of the invention have the following beneficial effects: 1, the gradient is formed by guiding oxygen while performing thermal oxidation with a mould, and the mould will play certain restriction effect on the surface of the spherical micro-channel plate so as to enable the spherical micro-channel plate to have the determined curvature radius; 2, the mould platform is used to control oxidizing gradient, so that the thickness of an oxidation layer forms the gradient to generate gradient stress, and the spherical silicon micro-channel plate is formed by releasing the stress.

Description

technical field [0001] The invention relates to a device for manufacturing a spherical silicon microchannel plate and a preparation method thereof, belonging to the technical field of micro-electromechanical systems. Background technique [0002] At present, my country's photoelectric detection multiplication technology is still in the research and development stage. As a large area array microchannel electron multiplier, the microchannel plate acts as a component for multiplying the electron flow distributed in two-dimensional space. At present, it is widely used in the detection of X-rays, γ-rays, extreme ultraviolet charged particles and electron multiplication devices. A channel tube of a microchannel is a dynode electronic intensifier, and an array combination of microchannels constitutes an intensifier. Add a certain voltage to both ends to get electronic gain. [0003] The techniques for making planar silicon microchannels mainly include oxidation, photolithography...

Claims

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Application Information

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IPC IPC(8): B81C1/00H01J9/00
Inventor 王连卫张弛李劢朱一平徐少辉
Owner EAST CHINA NORMAL UNIVERSITY
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