Device and manufacturing method for manufacturing silicon spherical micro-channel plate
A technology of silicon microchannel plate and manufacturing method, which is applied in the direction of manufacturing microstructure devices, microstructure devices, and techniques for producing decorative surface effects, and can solve the problems of short working life, harsh working environment, and microchannel plate manufacturing process. Complicated issues
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[0029] Embodiment: The planar silicon microchannel plate 1 that the sample adopts crystalline four-inch P-type silicon is made, and the mold table 2 adopts silicon material, and what the step hole adopts is circular. The specific production process is as follows:
[0030] Using the method provided by the patent application number 201110196442.4, and using the device provided by the patent application number 201120406111.4, a silicon microchannel plate was fabricated on a 4-inch silicon wafer, and each microchannel had a side length of 5 microns × 5 microns and a depth of 250 Micron, sidewall thickness 1 micron;
[0031] (1) Through laser cutting, obtain a wafer type silicon microchannel plate with a diameter of 16 mm;
[0032] (2) Wash the cut wafer-shaped silicon microchannel plate in No. 3 solution for 30 minutes, wash it in No. 1 solution for 10 minutes, and then rinse it in No. 2 solution for 10 minutes. Among them, No. 1 liquid is a certain proportion of H 2 o 2 and ...
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