SERS substrate and preparation method based on metal chloride nano film
A nano-film and chloride technology, which is applied in Raman scattering, material excitation analysis, etc., can solve the problems of high detection limit concentration and low SERS detection sensitivity, and achieve orderly and controllable morphology, excellent sensitivity, and high repeatability sexual effect
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Embodiment 1
[0040] This embodiment provides a method for preparing a metal chloride nano-film-based SERS substrate, which includes the following steps:
[0041] Step 1: Using the secondary anodic oxidation method, for the high purity (99.99%) metal aluminum film, use the oxalic acid solution with a concentration of 0.3mol / L, temperature 5℃, voltage 40V, oxidation for 3h to prepare an orderly regular structure oxidation Aluminum template, ordered and regular structure of nanopores distributed in array;
[0042] Step 2: Take the ordered and regular structure of alumina template with arrayed nanopore structure as the substrate, and deposit CuCl with a concentration of 47mg / L on its upper surface 2 Solution.
[0043] Step 3: Seal the sample, store it in a closed environment at 15°C for 240h, and obtain CuCl based on alumina substrate through self-organization 2 Nano film materials. The CuCl based on alumina substrate 2 The area of the nano film material is arbitrary and the shape is controllable....
Embodiment 2
[0052] This embodiment provides a method for preparing a metal chloride nano-film-based SERS substrate, which includes the following steps:
[0053] Step 1: Using the secondary anodic oxidation method, for the high purity (99.99%) metal aluminum film, use the oxalic acid solution with a concentration of 0.3mol / L, temperature 5℃, voltage 40V, oxidation for 3h to prepare an orderly regular structure oxidation Aluminum template, ordered and regular structure of nanopores distributed in array;
[0054] Step 2: Take the ordered and regular structure of the alumina template with an array of nanopore structure as the substrate, and deposit CuCl with a concentration of 20mg / L on its upper surface 2 Solution.
[0055] Step 3: Seal the sample, store it in a closed environment at 10°C for 280h, and obtain CuCl based on alumina substrate through self-organization 2 Nano film materials. The CuCl based on alumina substrate 2 The area of the nano film material is arbitrary and the shape is contr...
Embodiment 3
[0058] This embodiment provides a method for preparing a metal chloride nano-film-based SERS substrate, which includes the following steps:
[0059] Step 1: Using the secondary anodic oxidation method, for the high purity (99.99%) metal aluminum film, use the oxalic acid solution with a concentration of 0.3mol / L, temperature 5℃, voltage 40V, oxidation for 3h to prepare an orderly regular structure oxidation Aluminum template, ordered and regular structure of nanopores distributed in array;
[0060] Step 2: Take the ordered and regular structure of the alumina template with an array of nanopore structure as the substrate, and deposit CuCl with a concentration of 100mg / L on its upper surface 2 Solution.
[0061] Step 3: Seal the sample, store it in a closed environment at 35°C for 150h, and obtain CuCl based on alumina substrate through self-organization 2 Nano film materials. The CuCl based on alumina substrate 2 The area of the nano film material is arbitrary and the shape is cont...
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