Exposure platform of exposure machine

An exposure machine and platform technology, which is applied in the field of exposure platform, can solve the problems of deformation of light-transmitting plate, reduction of exposure resolution, and inability of photomask to fit tightly

Inactive Publication Date: 2017-04-26
CHIME BALL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, when the vacuum device vacuumizes between the stage and the exposure frame, the suction force of the vacuum gradually increases, because the surface of the substrate is not completely flat, and the surrounding edges of the light-transmitting plate are covered by the frame. Fixed, the light-transmitting plate cannot deform with the flatness of the substrate surface, resulting in the exposure frame and the mask on the exposure frame not being able to fully fit the substrate surface, thereby reducing the exposure resolution

Method used

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  • Exposure platform of exposure machine
  • Exposure platform of exposure machine
  • Exposure platform of exposure machine

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Embodiment Construction

[0042] In order to fully understand the purpose, features and effects of the present invention, now through the following specific embodiments, and in conjunction with the accompanying drawings, the present invention is described in detail, as follows:

[0043] The exposure platform 1 of the embodiment of the present invention is applied in an exposure machine for manufacturing circuit boards. The exposure machine has an internal space and an exposure light source 200 is disposed therein. Please refer to figure 1 The exposure platform 1 of the embodiment of the present invention is used to carry a substrate 100 and is positioned under the exposure light source 200. The exposure platform 1 includes an exposure frame 10, a stage 20, a plurality of lifting units 30 and a light-transmitting plate 40 ;Cooperate figure 2 As shown, the exposure frame 10 is a rectangular frame; the stage 20 can approach or move away from the exposure frame 10, and the upper surface 21 of the stage 20...

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Abstract

The invention discloses an exposure platform of an exposure machine. The exposure platform comprises an exposure frame, an objective table, a plurality of elevating units and a light-transmitting plate, wherein the objective table can approach to or keep away from the exposure frame; an accommodating region is formed in the upper surface of the objective table, and is used for putting a substrate and projecting incident light of an exposure light source to the substrate; the elevating units are arranged on the exposure frame; and the light-transmitting plate is combined with a clamp of each elevating unit, and is driven by the elevating units to move towards or away from the accommodating region of the objective table. The light-transmitting plate of the exposure platform disclosed by the invention is fixed to the bottom surface of the exposure frame through the clamps and the elevating units; and when vacuum pumping is carried out in the exposure step of a circuit board manufacture procedure, the light-transmitting plate can be driven by the elevating units, can be fitted to the substrate, and can deform along with the flatness of the substrate, so that the fitting tightness of the light-transmitting plate and the substrate is increased to improve the exposure resolution ratio.

Description

technical field [0001] The invention relates to an exposure platform of an exposure machine, in particular to an exposure platform in an exposure machine used for circuit board manufacturing process. Background technique [0002] In the existing exposure machine used in the circuit board manufacturing process, an exposure platform is used to align the exposure light source, the substrate and the mask, so as to facilitate the precise exposure of the exposure light source to the unshielded area on the substrate. Wherein, the existing exposure platform has a stage and an exposure frame, the stage is used to carry the substrate, the exposure frame has a rectangular frame and a light-transmitting plate arranged in the frame, the light-transmitting plate is used for After setting the photomask and pressing it on the surface of the substrate, in the circuit board manufacturing process, use the vacuum device connected to the stage to vacuumize between the stage and the exposure fram...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张鸿明
Owner CHIME BALL TECH
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