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Method for introducing phosphorus-containing groups on the surface of polyimide film

A polyimide film and phosphorus-based technology, which is applied in the field of engineering dielectric material preparation, can solve the problems that the insulation performance of polyimide cannot meet the requirements, and achieve the effects of improving thermal stability, simple implementation, and low tool cost

Active Publication Date: 2018-06-29
CHONGQING UNIV
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

However, in some occasions with higher voltage levels, the surface insulation performance of polyimide can not meet the requirements.

Method used

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  • Method for introducing phosphorus-containing groups on the surface of polyimide film
  • Method for introducing phosphorus-containing groups on the surface of polyimide film
  • Method for introducing phosphorus-containing groups on the surface of polyimide film

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Embodiment Construction

[0017] In order to make the purpose, technical solution and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below.

[0018] The method for introducing phosphorus-containing groups on the polyimide film surface may further comprise the steps:

[0019] 1) Using 4,4`-diaminodiphenyl ether and pyromellitic dianhydride as raw materials, and dimethylacetamide as a solvent, a two-step method is used to synthesize a polyimide film;

[0020] 2) The polyimide film is placed in a 1mol / L NaOH solution and treated at room temperature for 0.5 hours to hydrolyze its surface;

[0021] 3) The polyimide film is taken out, and the polyimide film after hydrolysis is alternately and repeatedly cleaned 5-10 times by using deionized water and n-propanol, and then placed in a phosphoric acid solution. The mass fraction of the phosphoric acid solution used is 85%, the reaction temperature is 100°C, and the r...

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Abstract

The invention belongs to the technical field of engineering dielectric and electrical engineering, and provides a simple method for introducing phosphorus-containing groups on the surface of a polyimide film, comprising the following steps: 1) soaking the synthesized polyimide film with NaOH solution to make it Surface hydrolysis; 2) The polyimide film is taken out and washed, and then placed in a phosphoric acid solution. The technical solution provided by the present invention is simple to implement, requires low tool costs, has good practicability, does not require special equipment and special processing conditions, and only needs heating and stirring devices to realize the introduction of phosphorus-containing groups. The operation is simple and the cost is low, and inorganic phosphorus-containing groups can be introduced on the surface of the polyimide, which helps to improve the thermal stability and flashover performance of the polyimide.

Description

technical field [0001] The invention belongs to the technical field of preparation of engineering dielectric materials, and in particular relates to a simple method for introducing phosphorus-containing groups on the surface of polyimide. Background technique [0002] Polyimide is a high molecular polymer material with excellent properties. It has excellent high and low temperature resistance, dielectric properties, very stable mechanical and mechanical properties in a wide temperature range, excellent chemical and physical stability and space radiation resistance, so it has been widely used in power electronics, aerospace, precision machinery and other fields. However, in some occasions with higher voltage levels, the surface insulation performance of polyimide can not meet the requirements. Contents of the invention [0003] In view of this, the object of the present invention is to provide a simple method for introducing phosphorus-containing groups on the surface of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J7/14C08J7/12C08J7/00C08L79/08C08G73/10
Inventor 王飞鹏张涛杨楠李剑杜林王有元陈伟根廖瑞金杨丽君姚陈果赵学童
Owner CHONGQING UNIV
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