A kind of deposition accelerator and application for mechanical copper plating and copper alloy coating
A technology for depositing accelerators and copper alloy layers, which is applied in the coating process and coating of metal materials. It can solve the problems of easy oxidation of metal copper and many standard electrode potentials, and achieve the effect of fast powder application and uniform color.
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Embodiment 1
[0017] The composition and weight percent of the deposition accelerator of mechanical copper plating and copper alloy layer described in the present embodiment are:
[0018] Diatomaceous earth 0.5%
[0019] Sodium Gluconate 1%
[0020] Triethanolamine 0.5%
[0021] Stannous Chloride 40%
[0022] Ammonium dihydrogen phosphate 1%
[0023] OP-10 6%
[0024] Sulfuric acid 1%
[0025] water 50%
[0026] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0027] The deposition accelerator for mechanical copper plating and copper alloy coating described in this embodiment is used for mechanical copper and copper alloy plating on the surface of iron and steel parts. The iron and steel parts to be plated are 100 kg of flat gaskets with a thickness of Ф20 and a thickness of 3 mm, and the surface area to be plated is 9.5 ㎡. Prepare the aqueous deposition accelerator solution according to the above raw materials and their we...
Embodiment 2
[0029] The composition and weight percent of the deposition accelerator of mechanical copper plating and copper alloy layer described in the present embodiment are:
[0030] Diatomaceous earth 1%
[0031] Sodium Gluconate 2%
[0032] Triethanolamine 1%
[0033] Stannous Sulfate 45%
[0034] Ammonium dihydrogen phosphate 3%
[0035] OP-10 8%
[0036] Phosphoric acid 1%
[0037] water 39%
[0038] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0039] The deposition accelerator for mechanical copper plating and copper alloy coating described in this embodiment is used for mechanical copper plating and copper alloy on the surface of iron and steel parts. The iron and steel parts to be plated are 100 kg of flat gaskets with a thickness of Ф16 and 2 mm, and the surface area to be plated is 14 ㎡. Prepare the aqueous deposition accelerator solution according to the above raw materials and their weight percentages (f...
Embodiment 3
[0041] The composition and weight percent of the deposition accelerator of mechanical copper plating and copper alloy layer described in the present embodiment are:
[0042] Diatomaceous earth 0.6%
[0043] Sodium Gluconate 1.4%
[0044] Triethanolamine 0.8%
[0045] Stannous Sulfate 35%
[0046] Ammonium dihydrogen phosphate 2.4%
[0047] OP-10 5%
[0048] Sulfuric acid 1.5%
[0049] Water 53.3%
[0050] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0051] The deposition accelerator for mechanical copper plating and copper alloy coating described in this embodiment is used for mechanical copper plating and copper alloy on the surface of iron and steel parts. The surface area is 22.5㎡. Prepare the aqueous deposition accelerator solution according to the above raw materials and their weight percentages (add sulfuric acid to the water first, then add OP-10, and finally add other chemical raw materials). The ...
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