Color film substrate and manufacturing method thereof

The technology of a color filter substrate and a manufacturing method, which is applied to the field of liquid crystal display screens, can solve the problems of increasing the number of photomask channels, complicated manufacturing processes, and difficulty in production, and achieves the effects of reducing the number of photomask channels and improving the shading effect.

Inactive Publication Date: 2015-12-02
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the manufacturing process of polysilicon technology is very complicated, and it is difficult to produce
For example, the production of the color filter substrate of the liquid crystal display panel in the prior art is relatively complicated, and requires a large number of photomasks. This is because the color filter substrate of the prior art needs to form a layer of black matrix on the glass substrate first. Otherwise, light leakage will occur at the connection between different color resists

Method used

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  • Color film substrate and manufacturing method thereof
  • Color film substrate and manufacturing method thereof

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Experimental program
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Effect test

Embodiment 1

[0027] Such as figure 1 As shown, it is a schematic cross-sectional structure diagram of a color filter substrate of the present invention, from figure 1 It can be seen that a color filter substrate in this embodiment includes a glass substrate 1 , a color filter layer formed on the glass substrate 1 , and a flat layer 7 formed on the color filter layer.

[0028] Wherein, the glass substrate 1 is provided with a light-shielding area and a light-transmitting area, and the color filter layer includes a first color-resist layer 2, a second color-resist layer 3, and a third color-resist layer formed on the glass substrate 1. Layer 4, a first light-shielding layer 5 and a second light-shielding layer 6, the first light-shielding layer 5 covers the light-shielding area, the second light-shielding layer 6 covers the first light-shielding layer 5, the The first light-shielding layer 5 and the second light-shielding layer 6 form an overlapping light-shielding layer, the overlapping li...

Embodiment 2

[0037] A method for manufacturing a color filter substrate in this embodiment includes:

[0038] The first color-resist layer 2, the second color-resist layer 3 and the third color-resist layer 4 are sequentially formed on the glass substrate, and the first color-resist layer 2, the second color-resist layer 3 and the third The color resist layer 4 covers the light-transmitting area of ​​the glass substrate 1 .

[0039] Wherein, when forming the first color-resist layer 2 and forming the second color-resist layer 3, one of the color-resist layers in the first color-resist layer 2 or the second color-resist layer 3 A part of the first light-shielding layer 5 is formed on the light-shielding area of ​​the glass substrate 1. When the third color-resisting layer 4 is formed, a part of the third color-resisting layer 4 covers the first light-shielding layer 5 The second light-shielding layer 6 is formed on it, and the light-shielding area is the area between the first color-resist...

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Abstract

The invention provides a color film substrate, comprising a glass substrate, a color filter layer, and a flat layer. The color filter layer comprises a first color-resisting layer, a second color-resisting layer, a third color-resisting layer, a first shading layer, and a second shading layer arranged on the glass substrate. The first shading layer and the second shading layer are overlapped in a shading region to form an overlapped shading layer. The structure of the color film substrate can replace a shading effect of a black matrix. The invention also provides a manufacturing method for the color film substrate. The method comprises: forming the first color-resisting layer, the second color-resisting layer, and the third color-resisting layer on the glass substrate in sequence, when the first color-resisting layer and the second color-resisting layer are formed, a part of a color-resisting layer of the first color-resisting layer or the second color-resisting layer covering the shading region to form the first shading layer, and when the third color-resisting layer is formed, a part of the third color-resisting layer covering on the first shading layer to form a second shading layer. The method can reduce the number of photomasks in color film substrate manufacturing.

Description

【Technical field】 [0001] The invention relates to the technical field of liquid crystal display screens, in particular to a color filter substrate and a manufacturing method thereof. 【Background technique】 [0002] With the development of the times, the development of liquid crystal display technology is getting faster and faster. The polysilicon technology with high mobility and high aperture ratio has gradually replaced the traditional amorphous silicon technology and is generally welcomed by everyone. However, the manufacturing process of polysilicon technology is very complicated and difficult to produce. For example, the production of the color filter substrate of the liquid crystal display panel in the prior art is relatively complicated, and requires a large number of photomasks. This is because the color filter substrate of the prior art needs to form a layer of black matrix on the glass substrate first. Otherwise, light leakage will occur at the connection between ...

Claims

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Application Information

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IPC IPC(8): G02F1/1335
CPCG02F1/1335G02F1/133512G02F1/133514G02F1/133516
Inventor 许勇
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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