Color film substrate and manufacturing method thereof

Abstract

The invention provides a color film substrate, comprising a glass substrate, a color filter layer, and a flat layer. The color filter layer comprises a first color-resisting layer, a second color-resisting layer, a third color-resisting layer, a first shading layer, and a second shading layer arranged on the glass substrate. The first shading layer and the second shading layer are overlapped in a shading region to form an overlapped shading layer. The structure of the color film substrate can replace a shading effect of a black matrix. The invention also provides a manufacturing method for the color film substrate. The method comprises: forming the first color-resisting layer, the second color-resisting layer, and the third color-resisting layer on the glass substrate in sequence, when the first color-resisting layer and the second color-resisting layer are formed, a part of a color-resisting layer of the first color-resisting layer or the second color-resisting layer covering the shading region to form the first shading layer, and when the third color-resisting layer is formed, a part of the third color-resisting layer covering on the first shading layer to form a second shading layer. The method can reduce the number of photomasks in color film substrate manufacturing.

Description

【Technical field】 [0001] The invention relates to the technical field of liquid crystal display screens, in particular to a color filter substrate and a manufacturing method thereof. 【Background technique】 [0002] With the development of the times, the development of liquid crystal display technology is getting faster and faster. The polysilicon technology with high mobility and high aperture ratio has gradually replaced the traditional amorphous silicon technology and is generally welcomed by everyone. However, the manufacturing process of polysilicon technology is very complicated and difficult to produce. For example, the production of the color filter substrate of the liquid crystal display panel in the prior art is relatively complicated, and requires a large number of photomasks. This is because the color filter substrate of the prior art needs to form a layer of black matrix on the glass substrate first. Otherwise, light leakage will occur at the connection between ...

AI Technical Summary

Problems solved by technology

However, the manufacturing process of polysilicon technology is very complicated, and it is difficult to produce

For example, the production of the color filter substrate of the liquid crystal display panel in the prior art is relatively complicated, and requires a large number of photomasks. This is because the color filter substrate of the prior art needs to form a layer of black matrix on the glass substrate first. Otherwise, light leakage will occur at the connection between different color resists, that is, the light-shielding area, and the display effect of the LCD panel will be reduced.

However, the method of forming the black matrix on the glass substrate in the prior art not only increases the number of photomasks in the manufacturing process of the color filter substrate, but also uses more materials for manufacturing the black matrix, which makes the manufacturing process more complicated, and the black matrix The shading effect is not very good, and small-scale light leakage often occurs

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