Array substrate and production method thereof, as well as display device
A technology of an array substrate and a manufacturing method, which is applied in nonlinear optics, instruments, optics, etc., can solve the problem that the shading area cannot be effectively used, and achieve the effect of effective utilization
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[0025] Example one
[0026] The embodiment of the present invention provides an array substrate, such as figure 1 with figure 2 As shown, the array substrate includes a plurality of light-transmitting areas 2 and a light-shielding area 1 surrounding each light-transmitting area 2. The light-shielding area 1 includes a first electrode 11, a photoelectric conversion film 12, and a second electrode 13 which are sequentially stacked. , The first electrode 11, the photoelectric conversion film 12 and the second electrode 13 constitute a photoelectric conversion unit, wherein the first electrode 11 is a transparent electrode.
[0027] It should be noted that the photoelectric conversion film 12 includes an N-type semiconductor film and a P-type semiconductor film. The N-type semiconductor film and the P-type semiconductor film form a PN junction; in addition, the photoelectric conversion film 12 may also include an N-type semiconductor film and a P-type semiconductor film. The I-type se...
Example Embodiment
[0043] Example two
[0044] The embodiment of the present invention provides a method for manufacturing an array substrate. The array substrate includes a plurality of light-transmitting areas, and a light-shielding area surrounding each light-transmitting area, such as image 3 As shown, the method includes:
[0045] In step S301, a first electrode layer is formed, and a pattern including the first electrode is formed on the shading area through a patterning process. Exemplarily, a first electrode layer is formed by plasma-enhanced chemical vapor deposition, sputtering, or thermal evaporation, and a photoresist is coated on the first electrode layer, and a mask with a pattern of the first electrode is used to cover After the first electrode layer coated with photoresist is exposed, developed, and etched, a pattern including the first electrode is formed on the shading area.
[0046] Step S302, forming a photoelectric conversion film layer, and forming a pattern including the photo...
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