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Method and apparatus for exposing a structure on a substrate

A substrate and exposed technology, which is applied in photolithography exposure devices, microlithography exposure equipment, optics, etc., can solve the problems of expensive, slow electron beam or ion beam exposure, etc.

Active Publication Date: 2019-02-15
INFINEON TECH AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, such electron beam or ion beam exposure is slow and expensive

Method used

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  • Method and apparatus for exposing a structure on a substrate
  • Method and apparatus for exposing a structure on a substrate
  • Method and apparatus for exposing a structure on a substrate

Examples

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Embodiment Construction

[0010] Various example embodiments will now be described more fully with reference to the accompanying drawings, in which some example embodiments are illustrated. In the drawings, the thickness of lines, layers and / or regions may be exaggerated for clarity.

[0011] Therefore, while the further embodiments are capable of various modifications and alternative forms, example embodiments thereof are shown by way of example in the drawings and will be described herein in detail. It should be understood, however, that there is no intention to limit example embodiments to the particular forms disclosed, but on the contrary, example embodiments are to cover all modifications, equivalents, and alternatives falling within the scope of the disclosure. Throughout the description of the figures, the same reference numerals refer to the same or similar elements.

[0012] It will be understood that when an element is referred to as being "connected" or "coupled" to another element, it can...

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Abstract

A method for exposing a structure on a substrate includes positioning of an invariable reticle and a programmable reticle in a light path between a light source and a layer on a substrate to be exposed to light and exposing the layer on the substrate by light from the light source passing the invariable reticle and the programmable reticle.

Description

technical field [0001] Embodiments relate to lithographic fabrication processes and in particular to a method and apparatus for exposing structures on a substrate. Background technique [0002] Exposure of the structures to be fabricated on the substrate can be accomplished in various ways. Different layers on the substrate are typically exposed using different invariant reticles. Alternatively, maskless exposure can be achieved by electron beam or ion beam writing devices. However, such electron beam or ion beam exposure is slow and expensive. It is desirable to provide a flexible concept for fast exposure of structures on a substrate at low cost. Contents of the invention [0003] Some embodiments relate to a method for exposing a structure on a substrate. The method includes positioning an invariant reticle and a programmable reticle in an optical path between a light source and a layer on a substrate to be exposed to the light, and passing light from the light sour...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70058G03F7/70283G03F7/70291G03F7/70325G03F7/70425
Inventor R·策尔扎赫尔P·伊尔西格勒
Owner INFINEON TECH AG