Method for reducing degradation caused by excess carriers in silicon substrate
A silicon substrate and degradation technology, applied in photovoltaic power generation, electrical components, climate sustainability, etc., can solve problems such as increasing recombination activity, achieve the effect of reducing lifespan degradation and improving performance
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[0031] figure 1 A flow chart is shown describing a method 100 for deactivating impurities in a silicon substrate, such as copper, that cause excess carrier-induced degradation, and thereby reducing the silicon substrate used, for example, in solar cell fabrication. The minority carrier lifetime degradation caused by excess carriers in the Impurities that lead to detrimental excess carrier-induced degradation, ie in this case photo-induced degradation, can also be, for example, iron.
[0032] At the start of the method in step 110, a blank monocrystalline or polycrystalline silicon substrate is fabricated by Czochralski processing or bulk casting. The silicon substrate may contain p-type and / or n-type silicon depending on the dopants used. The p-type silicon contains, for example, boron, aluminum, gallium and / or indium, and the n-type silicon contains, for example, phosphorus and / or arsenic. When a silicon substrate contains both p-type and n-type silicon, it naturally has p...
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