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Substrate processing equipment

A substrate processing device and substrate technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problem of processing liquid discharge and other issues

Active Publication Date: 2018-08-17
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Such bottle replacement operations will occur frequently during dozens to hundreds of process operations, and a large amount of treatment liquid will be discharged during this process

Method used

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  • Substrate processing equipment
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Embodiment Construction

[0026] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The problems to be solved, technical solutions and effects of the present invention as described above can be easily understood through the attached drawings and related embodiments. For clarity of description, some of the drawings are shown in simplified or exaggerated form. It should be noted that when adding reference signs to constituent elements in each drawing, the same constituent elements are marked with the same symbols as much as possible even in different drawings. In addition, in the following description of the present invention, if a specific description of a related known structure or function is considered to obscure the gist of the present invention, the detailed description thereof will be omitted.

[0027] In this embodiment, a substrate processing apparatus that applies a processing liquid to an object by an inkjet met...

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Abstract

The invention relates to an apparatus for treating a substrate through liquid, and the apparatus comprises a substrate supporting unit for supporting the substrate, and a liquid supply unit which is used for supplying liquid to a substrate processing unit. The substrate supporting unit comprises a supply tank, wherein the interior of the supply tank is provided with a storage space for storing processing liquid; a plurality of buffering tanks, wherein the interior of each buffering tank is provided with a buffering space for storing the processing liquid; a processing liquid spraying nozzle which is used for supplying the processing liquid supplied by the buffering tanks to the substrate; and a primary supply line which is used for connecting the supply tanks to the buffering tanks in a parallel manner. Therefore, after the processing liquid is put into the empty buffering tanks, the liquid processing technology of the substrate can be continued through the full buffering tanks.

Description

technical field [0001] The invention relates to a device for liquid processing a substrate. Background technique [0002] Recently, liquid crystal display devices are widely used as display screens of electronic equipment such as telephones and portable computers. This liquid crystal display device is to inject liquid crystal between the color filter substrate formed by black matrix, color filter, common electrode and alignment film and the array substrate formed by thin film transistor (TFT), pixel electrode and alignment film space, thereby utilizing the difference in the refractive index of light according to the anisotropy of the liquid crystal to obtain an image effect. [0003] As an apparatus for applying a treatment liquid such as an alignment liquid or a liquid crystal on a color filter substrate and an array substrate, an inkjet type application apparatus is mainly used. figure 1 It is a diagram showing supply of a treatment liquid to a liquid supply unit in a co...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67017H01L21/02052H01L21/67051H01L21/6715H01L21/67242
Inventor 金哲佑
Owner SEMES CO LTD