Method for determining focal plane of OPC (Optical Proximity Correction) model

A focal plane and model technology, applied in the field of microelectronics, can solve problems such as low model accuracy requirements, affecting model extension, affecting OPC model efficiency and accuracy, etc.
CN105676587AActive Publication Date: 2016-06-15SHANGHAI HUALI MICROELECTRONICS CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI HUALI MICROELECTRONICS CORP
Publication Date
2016-06-15

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Abstract

The invention provides a method for determining a focal plane of an OPC (Optical Proximity Correction) model. The method comprises the following steps: selecting a plurality of types of images to be detected; aiming at each type of image to be detected, measuring image key size values under a plurality of threshold values, and carrying out curve fitting to obtain a linear relation of the image key size values and the threshold values; calculating a model threshold value for establishing model data by using the linear relation according to a size after exposure used for establishing a model; slicing a wafer at a measuring position, and measuring the light resistance thickness of each image; aiming at each type of image to be detected, multiplying the obtained light resistance thickness by the model threshold value to obtain a distance from a light resistor imaging position to the bottom of a light resistor; and calculating an average value of the distances from the light resistor imaging position to the bottom of the light resistor, calculated by the plurality of types of images to be detected, so as to obtain an actual focal plane position; and calculating a theoretical focal plane position by using the calculated actual focal plane position.
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Description

technical field

[0001] The invention relates to the field of microelectronics, and more specifically, the invention relates to a method for determining the focal plane of an OPC (Optical Proximity Correction, optical proximity correction) model. Background technique

[0002] The focus plane refers to the focus position of the beam on the wafer surface, including two parameters of the theoretical focus plane and the actual focus plane, which determine the imaging position during the establishment of the OPC model, and are an important optical parameter when establishing the OPC model.

[0003] At present, the commonly used method to determine the focal plane is the global search method, that is, the actual focal plane and the theoretical focal plane are divided into multiple combinations with a certain step value, and then the OPC models are established respectively. By comparing the mean square errors of various models obtained, get the best model. There are two problems wi...

Claims

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