LED array
A technology of light-emitting diodes and semiconductors, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of large volume, increased lighting cost, low AC-DC conversion efficiency, etc.
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Embodiment 1
[0036] Embodiment 1 discloses that the LED array 1 is composed of 3 LED units. Its structural cross-sectional diagram is shown in Figures 1A-1I As shown, the top view of the structure is shown in Figure 1A'-1G' shown. A method for manufacturing a light emitting diode array 1, comprising the following steps:
[0037] 1. Provide a growth substrate 11, and form an epitaxial structure on the growth substrate 11, wherein the epitaxial structure includes a first conductivity type semiconductor layer 12, an active layer 13, and a second conductivity type semiconductor layer 14, such as Figure 1A and Figure 1A' shown.
[0038] 2. Then etch part of the epitaxial structure of the first region (I) and the second region (II) to form a plurality of trenches 15, wherein the unetched epitaxial structure forms a plurality of platforms 16; and the third region (III) The epitaxial structure is not etched, as Figure 1B and Figure 1B' shown.
[0039] 3. Form a conductive connection l...
Embodiment 2
[0046] Embodiment 2 discloses that the LED array 2 is composed of 3 LED units. Its structural cross-sectional diagram is shown in Figure 2A-2I As shown, the top view of the structure is shown in Figure 2A'-2G' shown. The manufacturing method of light-emitting diode array 2 comprises the following steps:
[0047] 1. Provide a growth substrate 11, and form an epitaxial structure on the growth substrate 11, wherein the epitaxial structure includes a first conductivity type semiconductor layer 12, an active layer 13, and a second conductivity type semiconductor layer 14, such as Figure 2A and Figure 2A' shown.
[0048] 2. Then etch part of the epitaxial structure to form a plurality of trenches 15, wherein the unetched epitaxial structure forms a plurality of platforms 16, such as Figure 2B and Figure 2B' shown.
[0049] 3. Form a conductive connection layer 17 on some areas of the plurality of platforms 16, wherein the platform area not covered by the conductive conn...
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