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A high-precision planar sub-aperture splicing detection method

A technology of sub-aperture splicing and detection method, applied in measurement devices, instruments, optical devices, etc., can solve the problem of not considering the influence of DC deviation, and achieve the effect of easy implementation, no increase in system cost, and high precision

Active Publication Date: 2018-04-17
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
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AI Technical Summary

Problems solved by technology

Shanghai Institute of Optics and Mechanics Li Yong and others studied the stitching cumulative error produced by least squares stitching sub-apertures, and proposed a method to reduce the stitching cumulative error of planar sub-apertures (9. [Li Yong, Tang Feng, Lu Yunjun, Wang Xiangchao , et al. A method to reduce the cumulative error of planar sub-aperture stitching [J]. China Laser, 2015, 42(7): 0708006.]), but it does not take into account the accumulation of DC deviation and the local slope difference perpendicular to the stitching direction Impact on splicing

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  • A high-precision planar sub-aperture splicing detection method
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  • A high-precision planar sub-aperture splicing detection method

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Embodiment Construction

[0026] In order to better understand the purpose, technical solutions and advantages of the embodiments of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the protection scope of the present invention should not be limited thereby.

[0027] The working principle of the present invention is as follows:

[0028] ① if figure 2 As shown, the slope difference in the x direction of the overlapping area is the cause of the cumulative error in the x direction;

[0029] ② if image 3 As shown, the slope difference in the y direction of the overlapping area is the cause of the cumulative error in the y direction;

[0030] ③ If the slope difference in the x-direction and y-direction of the overlapping area is subtracted during the splicing process, obvious splicing traces will be produced;

[0031] ④ The direct splicing results of the second-order Zernike aberrations such as items 4, 5, an...

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Abstract

The invention discloses a high-precision planar sub-aperture stitching detection method. The method comprises steps: a sub-aperture stitching detection device is built; the part surface shape of a to-be-detected optical element is measured, and sub-aperture surface shape data are obtained and stored; an overlapped region local slope difference is calculated; the overlapped region local slope difference is used for fitting a quasi reference mirror surface shape through a fourth item and a sixth item of Zernike aberrations; the fit quasi reference mirror surface shape is subtracted to obtain sub-aperture surface shape data removing the quasi reference mirror surface shape; and a full-aperture surface shape is obtained through anti-tilting and translation. Accumulated errors of two kinds of stitching in an x direction and a y direction can be effectively removed, the stitching can be ensured to be continuous, no stitching marks exist, the planar surface shape sub-aperture stitching detection precision is improved, no extra accessory or no extra calibration process does not need to be added, and the method has the advantages of easy realization, high precision, and not increased system cost.

Description

technical field [0001] The invention relates to the field of surface shape detection of large-caliber planar optical elements, in particular to the field of high-precision planar sub-aperture splicing detection. Background technique [0002] The sub-aperture splicing interferometry technology can realize the measurement of large-aperture optical components at low cost, while retaining the high precision of small-aperture measurement. In 1982, C.J.Kim of the Optical Center of the University of Arizona in the United States first proposed the concept of subaperture stitching interferometry (1. [C.Kim, J.Wyant. Subaperture test of a large flat or a fastaspheric surface[J].Opt.Soc.Am ., 1981, 71:1587]). In 1985, T.W.Stuhlinger proposed the discrete phase method, using the optical phase measurements of a large number of discrete points distributed on the sub-aperture to describe the wavefront. This idea is a new milestone in the development of sub-aperture testing and the prototy...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/2441
Inventor 朱鹏辉唐锋卢云君王向朝方伟李杰彭尝哲
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI