A method for uniform modification and processing of transparent medium microstructure

Abstract

The invention provides a uniform modification processing method of transparent medium microstructures. The uniform modification processing method comprises the following steps: processing a transparent medium by using first laser so that a plurality of modification regions are formed on the processed transparent medium; immersing the modified transparent medium into a corrosion solution to corrode the modification regions, verifying processing uniformity of the transparent medium and forming a plurality of hollow microstructures. The invention provides the uniform modification processing method of the transparent medium microstructures, the first laser comprises laser for generating high-temperature lattices and laser for reprocessing the high-temperature lattices, a preset time interval is reserved between the laser for generating the high-temperature lattices and the laser for reprocessing the high-temperature lattice, when the transparent medium is processed, by light beams which reach the transparent medium at first, the high-temperature lattice can be generated at a gathering position of the light beams by the transparent medium, light beams which reach the transparent medium later immediately process the high-temperature lattice, so that the uniformity of the transparent medium processed by the method is good, and the ideal design effect can be achieved.

Description

technical field [0001] The invention belongs to the field of optical technology, in particular to a method for uniformly modifying and processing transparent medium microstructures. Background technique [0002] Compared with the traditional long-pulse laser, the femtosecond laser has extremely short pulse duration, high peak power, small thermal effect and cold processing, and is widely used in the processing of transparent media. Its laser pulse can be focused in a small area by the objective lens to obtain extremely high power density, and it shows a strong nonlinear phenomenon when it interacts with transparent media. Through the process of avalanche ionization and photoionization, energy can be deposited on the material in a very short time. The focused area generates localized plasma expansion, resulting in a change in the effective refractive index of the material, enabling material modification or removal. The mechanism of action between the femtosecond laser and th...

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Problems solved by technology

[0003] The traditional femtosecond laser etching method for processing microstructures often has uneven processing areas, which makes it difficult to obtain ideal microstructures, which brings a lot of inconvenience to the general application of laser processing technology in the field of micromanufacturing.

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