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A shielding device, its shielding method, and an evaporation system

A technology of evaporation and evaporation source, which is applied in the field of shielding device and evaporation system, can solve the problems of poor repeatability, high cost associated with time, and high cost of materials, so as to improve stability and yield, realize continuity control, The effect of saving vapor deposition materials

Active Publication Date: 2019-01-22
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This evaporation method not only takes too long for the evaporation time, but often when the rate of the evaporation material is not stable, part of the evaporation material has been evaporated on the substrate to be coated, so that the control of the thickness of the evaporation film on the substrate to be coated is not enough. Accurate, not only wastes evaporation materials, but also affects the quality of the evaporation film layer on the substrate
[0004] The current evaporation process not only makes the yield rate of OLED display devices low, but also greatly increases the cost of OLED display devices, making OLED display devices difficult to replace LCD display devices.
Especially for the G2.5 production line, there are problems such as low production capacity, high material cost, high time accompanying cost, poor repeatability and stability, etc., and these problems have become bottlenecks hindering the development of OLED

Method used

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  • A shielding device, its shielding method, and an evaporation system
  • A shielding device, its shielding method, and an evaporation system
  • A shielding device, its shielding method, and an evaporation system

Examples

Experimental program
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Embodiment 1

[0033] This embodiment provides a shielding device, such as figure 1 As shown, it includes a power mechanism 1 and a shielding mechanism 2. The power mechanism 1 is used to drive the shielding mechanism 2 to change different positions. The evaporation channel between the plating source 3 and the evaporation rate sensor 5 is opened; it is also used to open the evaporation channel between the evaporation source 3 and the substrate 4 to be plated, and keep the evaporation source 3 and the evaporation rate sensor The evaporation channels between 5 are opened.

[0034] By setting the shielding mechanism 2, the shielding device can shield the vapor deposition channel between the vapor deposition source 3 and the substrate to be coated 4 in the vapor deposition rate control stage, and maintain the distance between the vapor deposition source 3 and the vapor deposition rate sensor 5. The evaporation channel between them can be opened; the evaporation channel between the evaporation s...

Embodiment 2

[0045] This embodiment provides a shielding device, which is different from Embodiment 1, such as Figure 5 As shown, the blocking mechanism 2 is in the shape of a cylinder, and one end of the cylinder is used to face the evaporation surface of the evaporation source 3. The diameter of the cylinder extends away from the power mechanism 1, and the diameter of the cylinder is greater than or equal to the evaporation surface of the evaporation source 3. The diameter of the plating source 3; the blocking mechanism 2 can rotate clockwise and counterclockwise within the range of 0-90° included angle between the tube diameter and the axis 31 of the evaporation source 3.

[0046] In this embodiment, in the vapor deposition rate control stage, when the cylindrical shielding mechanism 2 rotates to the shielding position, it just can completely shield the vapor deposition channel between the vapor deposition source 3 and the substrate to be coated 4, so as to avoid In the plating rate co...

Embodiment 3

[0052] This embodiment provides an evaporation system, including the shielding device in any one of Embodiments 1-2.

[0053] Wherein, the evaporation system also includes an evaporation source, an evaporation rate sensor and an evaporation film thickness controller, and the evaporation source is used for evaporating a film layer on the substrate to be coated. The evaporation rate sensor is used to collect the evaporation rate of the evaporation source, and send the collected evaporation rate to the evaporation film thickness controller. The evaporation film thickness controller is used to control the thickness of the film layer evaporated onto the substrate to be coated according to the evaporation rate. The control module of the shielding device is connected to the evaporation film thickness controller, and the evaporation film thickness controller is also used to control the control module to send a control command to the power mechanism.

[0054] By adopting the shielding...

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PUM

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Abstract

The invention provides a shielding device as well as a shielding method thereof and an evaporation system. The shielding device comprises a power mechanism and a shielding mechanism, wherein the power mechanism is used for driving the shielding mechanism to transform different positions; the shielding mechanism is used for shielding an evaporation channel between an evaporation source and a to-be-evaporated substrate and keeping an evaporation channel between the evaporation source and an evaporation rate inductor open, and is further used for opening the evaporation channel between the evaporation source and the to-be-evaporated substrate, and keeping the evaporation channel between the evaporation source and the evaporation rate inductor open. The shielding device realizes continuous control on evaporation, so that evaporation time is shortened, an evaporation material is saved, yield is increased, and cost is saved; and meanwhile, stability of the evaporation is improved, and yield of the evaporation is increased.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a shielding device, a shielding method and an evaporation system. Background technique [0002] In the field of display technology, the OLED evaporation process needs to control the rate of evaporation materials during the evaporation process. At present, a plurality of evaporation sources are usually arranged in the evaporation chamber of an OLED, and the evaporation material in each evaporation source is used for evaporation to form a functional layer (such as a light-emitting layer, an electron transport layer or a hole layer) of an OLED device. transport layer). A baffle is arranged directly above each evaporation source, the baffle is parallel to the evaporation surface of the evaporation source, and the size of the baffle is just enough to block the evaporation surface of the corresponding evaporation source. [0003] Each evaporation source starts to control the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24C23C14/56C23C14/54
CPCC23C14/042C23C14/24C23C14/54C23C14/56
Inventor 付文悦王小虎陈立强
Owner BOE TECH GRP CO LTD