Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Leather shoe polish applying device for shoe making

A technology for leather shoes and shoe polish, applied in the direction of shoemaking machinery, application, footwear, etc., can solve the problems of large labor, poor smearing effect, uneven smearing, etc. Effect

Active Publication Date: 2016-11-16
杨娇仔
View PDF8 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to overcome the shortcomings of the existing application of shoe polish, such as large amount of labor, uneven application, and poor application effect, the technical problem to be solved by the present invention is to provide a shoe polish application for leather shoes with a small amount of labor, uniform application, and good application effect device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Leather shoe polish applying device for shoe making
  • Leather shoe polish applying device for shoe making
  • Leather shoe polish applying device for shoe making

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A shoe polish device for leather shoes for shoemaking, such as Figure 1-4 Shown, comprise left support 1, base plate 2, motor 3, small pulley 4, flat belt 5, first bearing seat 6, rotating shaft 7, large pulley 8, right support 9, second place plate 10, cylinder body 11, Piston 12, cylinder 13, swing rod 14, third electric push rod 15, soft brush 16, first placement plate 17, horizontal bar 18, first slide rail 19, moving block 20, first slide block 21, first connection Rod 22, second connecting rod 23, gear 24, rack 25, second slider 26, second slide rail 27, top plate 28 and first electric push rod 29, the top of bottom plate 2 is provided with left bracket in turn from left to right 1. The motor 3, the first bearing seat 6 and the right bracket 9, the top of the left bracket 1 is provided with a top plate 28, the bottom of the top plate 28 is provided with a second slide rail 27, and the second slide rail 27 is provided with a second slider 26, the second Two slide...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a shoe polish applying device, in particular to a leather shoe polish applying device for shoe making, and aims at solving the technical problem of providing a leather shoe polish applying device which is used for shoe making and is small in labor amount, uniform in applying and good in applying effect. For solving the technical problem, the leather shoe polish applying device for shoe making comprises a left support, a bottom plate, a motor, a small belt pulley, a flat belt, a first bearing seat, a rotating shaft, a large belt pulley, a right support, a second carrying plate, a cylinder body, a piston and the like; the top of the bottom plate is sequentially provided with the left support, the motor, the first bearing seat and the right support from left to right, the top of the left support is provided with a top plate, the bottom of the top plate is provided with a second sliding rail, and the second sliding rail is provided with a second sliding block. According to the device, the effects of being small in labor amount, uniform in applying and good in applying effect are achieved, leather shoes are automatically moved, shoe polish is automatically applied, operation time can be shortened, the efficiency can be improved, and benefits can be increased.

Description

technical field [0001] The invention relates to a device for applying shoe polish, in particular to a device for applying shoe polish to leather shoes for shoemaking. Background technique [0002] Leather shoes refer to footwear with natural leather as the upper and leather or rubber, plastic, PU foam, PVC, etc. as the sole, which are processed by sewing, gluing or injection molding. Leather shoes are air-permeable, moisture-absorbing, have good hygienic performance, and are the shoes with the highest grade among all kinds of shoes and boots. Thousands of years ago, human ancestors had the habit of wearing shoes, wrapping their feet with animal skins, from leather shoes to modern leather shoes, leather shoes have a long history. In China, the production of modern leather shoes has only a history of more than 120 years, but because the shape, style, structure and wearing function of leather shoes are better than other footwear, the production of leather shoes has developed r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A43D95/16
CPCA43D95/16
Inventor 杨娇仔
Owner 杨娇仔
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com