Stress and strain detection device based on illumination intensity measurement

A technology of light intensity and detection device, which is applied in the direction of measurement device, optical device, and measurement of the change force of optical properties of materials when they are stressed, which can solve the problems of difficult to cover large-scale stress measurement, large weight, and spring parameters. Adjust complex issues such as

Active Publication Date: 2016-11-23
贾岳杭
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The force detection of this sensor device is unidirectional, and the parameter adjustment of the spring is also very complicated, the weight is heavy, and it is difficult to cover the needs of large-scale stress measurement.

Method used

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  • Stress and strain detection device based on illumination intensity measurement
  • Stress and strain detection device based on illumination intensity measurement
  • Stress and strain detection device based on illumination intensity measurement

Examples

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Embodiment Construction

[0032] The following is based on Figure 1~Figure 9 And embodiment, technical scheme and beneficial effect of the present invention are described further.

[0033] Such as figure 1 Shown is the structure of embodiment 1 when stress and strain do not occur;

[0034] Such as Figure 4 with Figure 9 Shown is the structure of Example 1 under stress and strain.

[0035] Such as figure 1 , Figure 4 with Figure 9 As shown, Embodiment 1 includes a first corresponding surface 1, a second corresponding surface 2, several photosensitive sensors 3 and a light source 4; an optical path gap 5 is left between the first corresponding surface 1 and the second corresponding surface 2;

[0036] The photosensitive sensor 3 and the light source 4 are arranged on both the first corresponding surface 1 and the second corresponding surface 2, and the light source 4 and the photosensitive sensor 3 are in a uniform cross arrangement; the photosensitive sensor 3 is used for sensing The light ...

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Abstract

The invention discloses a stress and strain detection device based on illumination intensity measurement, and belongs to the field of stress and strain detection. The stress and strain detection device comprises a first corresponding face, a second corresponding face, multiple photosensitive sensors and multiple light sources, wherein the photosensitive sensors and the light sources are arranged on the first corresponding face and/or the second corresponding face, an optical path gap is reserved between the first corresponding face and the second corresponding face, and the first corresponding face and the second corresponding face are placed oppositely. The photosensitive sensors are used for sensing illumination intensity of light coming from the light source and reaching the photosensitive sensors after being propagated in different directions. The stress and strain detection device has the advantages of being low in cost, light in weight, simple in machining process, high in reliability, wide in application range and capable of efficiently meeting the requirement of large-area stress and strain measurement.

Description

technical field [0001] The invention relates to a stress and strain detection device based on light intensity measurement, which belongs to the field of stress and strain detection. Background technique [0002] At present, traditional stress detection mostly uses piezoresistive strain sensors or mechanical pressure sensors. [0003] One is a piezoresistive strain sensor. The resistance strain gauge is a sensitive device that converts the force and strain changes on the measured object into electrical signals. It is one of the main components of the piezoresistive strain sensor. The most widely used strain gauges are metal resistance strain gauges and semiconductor strain gauges. Usually, the strain gauges are tightly bonded to the substrate that generates stress and strain through a special adhesive. When the substrate is stressed and the stress changes , the resistance strain gauge also deforms together, so that the strain resistance directly diffused on it changes in pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01L1/24G01B11/16
CPCG01B11/16G01L1/24
Inventor 贾岳杭
Owner 贾岳杭
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