Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Stress and strain detection device based on illumination intensity measurement

A technology of light intensity and detection device, which is applied in the direction of measurement device, optical device, and measurement of the change force of optical properties of materials when they are stressed, which can solve the problems of difficult to cover large-scale stress measurement, large weight, and spring parameters. Adjust complex issues such as

Active Publication Date: 2016-11-23
贾岳杭
View PDF7 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The force detection of this sensor device is unidirectional, and the parameter adjustment of the spring is also very complicated, the weight is heavy, and it is difficult to cover the needs of large-scale stress measurement.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stress and strain detection device based on illumination intensity measurement
  • Stress and strain detection device based on illumination intensity measurement
  • Stress and strain detection device based on illumination intensity measurement

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The following is based on Figure 1~Figure 9 And embodiment, technical scheme and beneficial effect of the present invention are described further.

[0033] Such as figure 1 Shown is the structure of embodiment 1 when stress and strain do not occur;

[0034] Such as Figure 4 with Figure 9 Shown is the structure of Example 1 under stress and strain.

[0035] Such as figure 1 , Figure 4 with Figure 9 As shown, Embodiment 1 includes a first corresponding surface 1, a second corresponding surface 2, several photosensitive sensors 3 and a light source 4; an optical path gap 5 is left between the first corresponding surface 1 and the second corresponding surface 2;

[0036] The photosensitive sensor 3 and the light source 4 are arranged on both the first corresponding surface 1 and the second corresponding surface 2, and the light source 4 and the photosensitive sensor 3 are in a uniform cross arrangement; the photosensitive sensor 3 is used for sensing The light ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a stress and strain detection device based on illumination intensity measurement, and belongs to the field of stress and strain detection. The stress and strain detection device comprises a first corresponding face, a second corresponding face, multiple photosensitive sensors and multiple light sources, wherein the photosensitive sensors and the light sources are arranged on the first corresponding face and / or the second corresponding face, an optical path gap is reserved between the first corresponding face and the second corresponding face, and the first corresponding face and the second corresponding face are placed oppositely. The photosensitive sensors are used for sensing illumination intensity of light coming from the light source and reaching the photosensitive sensors after being propagated in different directions. The stress and strain detection device has the advantages of being low in cost, light in weight, simple in machining process, high in reliability, wide in application range and capable of efficiently meeting the requirement of large-area stress and strain measurement.

Description

technical field [0001] The invention relates to a stress and strain detection device based on light intensity measurement, which belongs to the field of stress and strain detection. Background technique [0002] At present, traditional stress detection mostly uses piezoresistive strain sensors or mechanical pressure sensors. [0003] One is a piezoresistive strain sensor. The resistance strain gauge is a sensitive device that converts the force and strain changes on the measured object into electrical signals. It is one of the main components of the piezoresistive strain sensor. The most widely used strain gauges are metal resistance strain gauges and semiconductor strain gauges. Usually, the strain gauges are tightly bonded to the substrate that generates stress and strain through a special adhesive. When the substrate is stressed and the stress changes , the resistance strain gauge also deforms together, so that the strain resistance directly diffused on it changes in pr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01L1/24G01B11/16
CPCG01B11/16G01L1/24
Inventor 贾岳杭
Owner 贾岳杭
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com