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A Adding Method of Selectively Resizing Graphics

A size-adjusting and selective technology, which is applied to the photographic process of the pattern surface, the original for photomechanical processing, instruments, etc., can solve the problems of bias addition, breakage or bridging, etc., and achieve the goal of reducing breakage and bridging Effect

Active Publication Date: 2019-11-22
SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This method violates the design rules after pre-adding SSA, because the bias cannot be added, and breakage or bridging may occur

Method used

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  • A Adding Method of Selectively Resizing Graphics
  • A Adding Method of Selectively Resizing Graphics
  • A Adding Method of Selectively Resizing Graphics

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Embodiment Construction

[0025] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the present invention is not limited to this specific embodiment, and general replacements known to those skilled in the art are also covered within the protection scope of the present invention.

[0026] The following is attached Figure 1-4 The present invention will be described in further detail with specific examples. It should be noted that the drawings are all in a very simplified form, using imprecise scales, and are only used to facilitate and clearly achieve the purpose of assisting in describing the present embodiment.

[0027] see figure 1 , the method for adding selectively resizing graphics in this embodiment can be used for OPC correction of photomask graphics, including:

[0028] Step 01: Calculate the line width and spacing where the edges...

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Abstract

The invention provides a method for adding an SSA graph, and the method is used for correcting a photomask graph. The method comprises the steps that the lines and the spaces of the positions wherein the edges of a pre-added SSA graph are located are calculated; the edges of the pre-added SSA graph are pre-moved according to the table of the pre-added SSA graph; the lines and the spaces of the pre-moved graph are examined; whether the positions of the edges of the pre-moved graph go against the preset design rule or not is judged; if not, bias is added to the edges of the pre-moved graph according to the table, and accordingly, a target graph is obtained; if yes, the pre-moved edges going against the design rule are cycled back until the edges meet the design rule, and accordingly, the target graph is obtained. According to the method for adding the SSA graph, appropriate bias can be added aiming at the places where bias cannot be added due to design rule limit after pre-movement, and accordingly, fracture and bridging are reduced.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a method for adding selectively adjusted size graphics. Background technique [0002] In the advanced photolithography process, due to the reduction in the size of the exposure pattern, the photomask pattern must be pre-corrected (Optical Proximity Correction, OPC) to compensate for the optical proximity effect caused by the limited resolution of the optical system. . [0003] With the continuous reduction of feature size and the increasing complexity of patterns, OPC technology has also been continuously developed to adapt to the continuous problems in the pattern imaging process. It is necessary to increase the process window by adding selective size adjust (SSA, selective size adjust) on some key layers. The traditional SSA addition rule is to judge the line width (line) and spacing (space) value of the edge after the pre-added SSA to determine whether to add the offs...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/36
CPCG03F1/36
Inventor 齐雪蕊何大权魏芳朱骏吕煜坤张旭升
Owner SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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