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An exposure machine, an exposure method, and a displacement control method for a transparent alignment member

An exposure machine and transparent technology, which is applied in the direction of photomechanical equipment, microlithography exposure equipment, and photoplate making process of pattern surface, etc., can solve the problems of specific models and low utilization rate of UV masks

Active Publication Date: 2018-05-08
HEFEI BOE OPTOELECTRONICS TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Embodiments of the present invention provide an exposure machine, an exposure method, and a displacement control method of a transparent alignment member, which can solve the problems of specific models of light-shielding plates made by UV masks and low utilization rates of UV masks.

Method used

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  • An exposure machine, an exposure method, and a displacement control method for a transparent alignment member
  • An exposure machine, an exposure method, and a displacement control method for a transparent alignment member
  • An exposure machine, an exposure method, and a displacement control method for a transparent alignment member

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Embodiment Construction

[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0038] An embodiment of the present invention provides an exposure machine, such as figure 1 As shown, it includes a light-shielding plate stage 20, a first positioning device 50, and a mask plate stage 30 arranged on the frame 10. The light-shielding plate stage 20 is connected to the first positioning device 50, and can be placed on the first positioning device 50. Driven to move on the horizontal plane, the frame 10 is also provided with a transparent align...

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Abstract

The embodiment of the invention provides an exposure machine, an exposure method and a shifting control method of a transparent alignment part and belongs to the technical field of display. The problem that a visor made by a UV mask is specific in model and the UV mask is too low in utilization rate can be solved. The exposure machine comprises a visor carrying table arranged on a rack, a first positioning device and a mask carrying table, wherein the visor carrying table is connected with the first positioning device and can move on a horizontal plane under the driving of the first positioning device, the transparent alignment part is further arranged on the rack, an alignment mark is arranged on the transparent alignment part, the transparent alignment part is arranged between the visor carrying table and the mask carrying table through a second positioning device, and the second positioning device can drive the transparent alignment part to move on the horizontal plane.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an exposure machine, an exposure method and a displacement control method of a transparent alignment member. Background technique [0002] Thin Film Transistor-Liquid Crystal Display (TFT-LCD for short) has the characteristics of small size, low power consumption, no radiation, and relatively low manufacturing cost, and occupies a dominant position in the current flat panel display market. Thin film transistor liquid crystal display mainly includes array substrate (can be called TFT substrate, TFT full name is Thin Film Transistor) and color filter substrate (can be called CF substrate, CF full name is Color Filter), among them, the array substrate is mainly used to form driving For array devices, the color film substrate is mainly used to form a color film layer. After the array substrate and the color film substrate are manufactured, they are combined, and the sealant is appli...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70716G03F7/70775
Inventor 史高飞张俊周如杨丽娟刘承娜
Owner HEFEI BOE OPTOELECTRONICS TECH