Coating device and coating method
A coating device and coating method technology, applied in the device, coating, optics and other directions of coating liquid on the surface, can solve the problems of butterfly Mura, thinning of photoresist film thickness, uneven film layer, etc., to reduce Effect of Butterfly Mura
Active Publication Date: 2017-02-22
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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[0004] However, since the substrate will be adsorbed on the marble platform during the coating process, if there are particles (Particles) on the marble platform, or particles (Particles) are attached to the back of the substrate, the flatness of the substrate there will change, and it is easy to As a result, the thickness of the photoresist film after coating becomes thinner, and the uneven film layer coated on the substrate is likely to cause butterfly Mura to appear during display.
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[0032] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0033] In addition, the following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, for example, "upper", "lower", "front", "rear", "left", "right", "inner", "outer", "side", etc., only is to refer to the direction of the attached drawings. Therefore, the direction te...
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The invention discloses a coating device. The coating device comprises a first platform, a second platform, a third platform, a coating nozzle and a dragging device, wherein the first platform is provided with a plurality of first air blowing holes used for enabling a substrate to suspend above the first platform through air blowing; the second platform is provided with a plurality of second air blowing holes and a plurality of adsorption holes which are alternately distributed and are used for enabling the substrate to suspend above the second platform through air blowing and adsorption force; the third platform is provided with a plurality of third air blowing holes used for enabling the substrate to suspend above the third platform through air blowing; the first platform, the second platform and the third platform are sequentially distributed in the first direction; the coating nozzle is positioned above the second platform, and is used for spraying a photoresist material on the substrate; and the dragging device is used for dragging the substrate to sequentially pass through the first platform, the second platform and the third platform. The coating device is uniform in coating. The invention further discloses a coating method.
Description
technical field [0001] The invention relates to the technical field of liquid crystal display panel preparation, in particular to a coating device and a coating method. Background technique [0002] In the manufacturing process of the liquid crystal display panel, it is necessary to evenly coat a layer of photoresist material with a specific thickness on the substrate. [0003] The coating equipment used today is a linear coater (Linear Coater). The platform (Plate) of this type of coating machine carrying the substrate is a fixed marble platform. When the substrate is on the marble, the coating operation is carried out by the movement of the coating nozzle (Nozzle). [0004] However, since the substrate will be adsorbed on the marble platform during the coating process, if there are particles (Particles) on the marble platform, or particles (Particles) are attached to the back of the substrate, the flatness of the substrate there will change, and it is easy to As a result...
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Login to View More IPC IPC(8): B05C5/02B05C11/00B05C13/02G02F1/13
CPCB05C5/0245B05C11/00B05C13/02G02F1/1303
Inventor 郭开超
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD