14results about How to "Improve surface uniformity" patented technology

The invention belongs to the field of chips, and particularly relates to a capacitor, a memory and a manufacturing method of the memory. The capacitor may include: a first electrode layer; a second electrode layer; the strontium titanate dielectric layer is formed between the first electrode layer and the second electrode layer, and in the direction from the center of the strontium titanate dielectric layer to the two opposite sides of the strontium titanate dielectric layer, the ratio of Sr / (Sr + Ti) in the strontium titanate dielectric layer is gradually decreased, and the ratio of Sr / (Sr + Ti) in the strontium titanate dielectric layer is gradually decreased. One side of the two opposite sides of the strontium titanate dielectric layer is close to the first electrode layer, and the other side of the strontium titanate dielectric layer is close to the second electrode layer. The capacitor of the scheme has the characteristics of high K value and low electric leakage.

The application discloses a driving circuit and a method thereof of a display panel, the display panel and a display device, and relates to the technical field of display. The circuit comprises a picture detection module, the picture detection module is arranged to detect a picture scene type of an input picture, and determine a picture detection signal according to the picture scene type; a compensation trigger module, a signal trigger end of the compensation trigger module is electrically connected with a first signal interface of the picture detection module, the compensation trigger module is arranged to receive the picture detection signal sent by the picture detection module, and trigger a level signal of a heavy load picture according to the picture detection signal, and generate a clock signal; and a charging compensation module, a signal input end of the charging compensation module is electrically connected with a signal output end of the compensation trigger module, the charging compensation module is arranged to perform charging compensation according to the clock signal sent by the compensation trigger module. The application aims to improve the surface uniformity of a super-large size screen picture display.

The invention relates to a wave-transparent composite material with high surface flatness and low surface roughness and a forming method. The wave-transparent composite material comprises a fiber reinforced resin-based wave-transparent composite material main body layer, an ultrathin fiber cloth reinforced resin-based wave-transparent material transition layer and a thermoplastic film surface layer which are arranged in sequence. The forming method of the wave-transparent composite material comprises the following steps: sequentially laying the fiber reinforced resin prepreg (prepreg A), the ultrathin fiber cloth reinforced resin prepreg (prepreg B) and the thermoplastic polymer film on a mold, and then integrally hot-pressing, curing and forming. The wave-transparent composite material is compact and uniform in surface, high in flatness and low in roughness.

The utility model provides a semiconductor process machine table and semiconductor process equipment, a temperature control structure is arranged in a bearing table, and the upper surface of the bearing table is a flush surface; a first temperature control pipeline in the temperature control structure is located in a first area, and a second temperature control pipeline is located in a second area surrounding the first area. The first temperature control pipeline and the second temperature control pipeline are the same in pipe diameter and different in distance from the upper surface of the bearing table. According to the utility model, the temperature control structure is partitioned to respectively control the temperatures of the center and the edge of the bearing table, so that the reaction rate of the wafer on the bearing table is uniform; meanwhile, by setting the positions of the partitions, the temperature adjustment better conforms to the reaction rate distribution, and the reaction uniformity is improved; in addition, the temperature of the bearing table is adjusted by setting the heights of the first area and the second area to be different, and the improvement method is simple and convenient to apply; finally, the temperature of the machine table is adjusted by setting different fluid flow rates of the temperature control pipeline, the form of the temperature control structure does not need to be changed, and the method is simple and convenient and facilitates popularization.

A method of plasma etching a workpiece is disclosed. The method includes the steps of placing the workpiece on a substrate support within a plasma chamber, wherein the workpiece comprises a SiC substrate; introducing SF6, O2, and He process gases into the plasma chamber; plasma etching the SiC substrate by alternating between (i) applying a bias RF power to the substrate support to generate a reactive ion etch plasma in the plasma chamber and etching the SiC substrate at a first plasma chamber pressure for a first time period; and (ii) applying a source RF power to the plasma chamber to generate an inductively coupled plasma in the plasma chamber and applying a bias RF power to the substrate support, and etching the SiC substrate at a second plasma chamber pressure for a second time period, thereby reducing a surface roughness of the SiC substrate.

The application discloses a microwave plasma etching device and method, which comprises an etching chamber, a moving platform, a plasma torch, a gas supply assembly and a microwave generator. The moving platform is movably arranged in the etching chamber and used for placing materials to be processed. The plasma torch comprises a nozzle, the nozzle is arranged relative to the moving platform and connected to the inner wall of the etching chamber, the inside of the nozzle is hollow, and the nozzle is provided with a jet hole relative to the moving platform. The gas supply assembly comprises a first gas supply part, the gas outlet end of the first gas supply part is connected to the inside of the nozzle and used for providing plasma generating gas. The microwave generator is connected to the nozzle and used for providing a microwave signal for the nozzle to form a plasma flame. The application can solve the problem that in the prior art, the bias voltage is easily generated due to the discharge of positive and negative electrodes in the plasma forming process, thereby causing electrostatic discharge loss.

The invention discloses a thermoplastic high-strength fiber covering yarn prefabricated composite material and a preparation method thereof. The preparation method provided by the invention comprises the following steps: 1) impregnating core yarns in a resin sizing agent and resin slurry, and carrying out pre-impregnation treatment to obtain high-strength fiber core yarns; wherein the material of the resin slurry is selected from at least one of polyether-ether-ketone, nylon and polypropylene; 2) covering the surface of the high-strength fiber core yarn with the yarn by using a multi-spindle knitting machine to obtain a knitted core-spun yarn; (3) weaving the weaving covering yarn through a multi-spindle weaving machine to obtain a covering yarn preset sleeve; and 4) curing the core-spun yarn preset sleeve to obtain the thermoplastic carbon fiber woven reinforced composite material. The composite material provided by the invention has the characteristics of high resin content, high structural stability and excellent interface performance, also has high flexibility, can be packaged by folding, winding, winding and the like, realizes extremely low space occupancy, is convenient to store and transport, and greatly reduces the storage and transportation cost.

This utility model relates to the field of laser cutting technology, specifically to a device for diamond laser cutting, comprising a laser, a mirror assembly, a circular polarizer, a beam expander, and a cutting head; the laser is used to emit linearly polarized laser light; the mirror assembly is used to reflect the linearly polarized laser light emitted by the laser to the circular polarizer; the circular polarizer is fixedly installed and used to convert the incident linearly polarized laser light into circularly polarized laser light; the beam expander is installed on the output path of the circular polarizer and is used to expand the circularly polarized laser beam; the cutting head is installed on the output path of the beam expander, and its central axis forms an adjustable angle with the Z-axis. The cutting head focuses the laser light to form a light cone, which acts on the diamond to achieve cutting.

The wandering star wheel comprises a body, the body is provided with a liquid flowing hole and a space ring hole, a space ring is arranged in the space ring hole, the space ring is provided with a fixing hole used for containing the quartz plate, and the outer edge of the space ring is provided with a fixing protrusion to abut against the opening edge of the space ring hole. The space ring hole is round so that the space ring can rotate relative to the body, and a rubber strip is arranged on the opening edge of the fixing hole so as to abut against the quartz plate. According to the wandering star wheel for grinding the double faces of the quartz plate, smooth circulation of liquid is guaranteed through the liquid flowing holes, and the stable machining environment is maintained; the circular space ring hole allows the space ring to rotate relatively, the quartz plate is promoted to rotate automatically, and the surface uniformity and precision are improved; fixing protrusions on the outer edges of the space rings reduce friction and increase the autorotation speed; the rubber strip at the edge of the fixing hole provides buffering, vibration and impact are reduced, the defect occurrence rate is reduced, and the product yield is remarkably improved.

The utility model discloses a white pad for wafer rough polishing belongs to the technical field of polishing pad, a white pad for wafer rough polishing, including polishing pad layer, the upper end of polishing pad layer is provided with fluid storage pad, the upper end sealed coupling of fluid storage pad has base surface layer, the inside of fluid storage pad is provided with integrative fluid flow cavity, and the inside of fluid flow cavity has non - newtonian fluid layer. The utility model solves the problem that the existing wafer grinding pad in actual use process, and the partial buffer invalidation of polishing pad caused by the breakage of micro air bag will affect the continuity work, the non - newtonian fluid layer of the utility model in the grinding process, and the viscosity changes with the real - time change of pressure, shear rate, realizes adaptive buffer, reduces the wafer edge collapse response speed that partial stress concentration leads to, and the action of cooperation grinding particle can reduce partial leakage, and the surface uniformity is promoted.

The invention relates to a preparation method of a stamping and galling resistant GI coating product, and belongs to the technical field of steel rolling. The method comprises the following steps: carrying out hot galvanizing treatment on strip steel to obtain galvanized strip steel; carrying out aerial fog cooling on the galvanized strip steel so as to form fine and uniform spangles on the surface of the galvanized strip steel; carrying out air cooling on the galvanized strip steel subjected to aerial fog cooling; and the air-cooled galvanized strip steel is subjected to finishing treatment, so that the Rsk value of the surface of the galvanized strip steel is a negative number, and the galvanized plate is obtained. Small-size spangles are obtained on the surface of the galvanized strip steel through aerial fog cooling, and the reduction of the sizes of the spangles is beneficial to improving the surface uniformity of the galvanized strip steel; by controlling the Rsk value of the surface of the roller of the finishing machine to be a positive value, the surface of the galvanized strip steel obtains a negative Rsk value, and therefore it is guaranteed that the surface of the galvanized strip steel has good abrasion resistance; the surface roughness of the obtained galvanized sheet is at a low level, and it is guaranteed that the surface coating of the galvanized sheet has good galling resistance.

The invention discloses an SIC uniform machining device which comprises a rotating platform, an adsorption assembly is arranged on the rotating platform, a machined product is connected to the adsorption assembly in an adsorption mode, the adsorption assembly and the rotating platform rotate synchronously, a grinding wheel assembly is arranged on the adsorption assembly, and the grinding wheel assembly abuts against the machined product. The rotating platform drives the machined product to rotate, and the grinding wheel assembly rotates to grind the machined product, so that the machined product can achieve the uniform grinding effect in the machining process. Through the adsorption effect of the adsorption assembly, mechanical connection of the machined product is avoided, and therefore damage to the machined product is reduced.

The invention discloses a photosensitive resin plate for polaroid attachment, which is prepared from the following components: urethane acrylate, a vinyl unsaturated monomer, a photoinitiator and a solvent, the urethane acrylate, the vinyl unsaturated monomer and the photoinitiator are mixed to form resin, the mass ratio of the resin to the solvent is 9: 1-5: 5, the mass ratio of the polyurethane acrylate to the resin is 40%-75%, the mass ratio of the vinyl unsaturated monomer to the resin is 20%-55%, and the mass ratio of the initiator to the resin is 1%-6%. The photosensitive resin plate can effectively absorb impact force generated in the attaching process, the deformation quantity is small, and the generation probability of bubble lines is reduced. The peeling strength of the photosensitive resin plate ranges from 3N / 25mm < 2 > to 8N / 25mm < 2 >, the polaroid can be stably adhered and fixed, the peeling strength is small enough, and the polaroid can smoothly fall off in the transferring and attaching process.

The present invention relates to a positive electrode for a lithium-sulfur battery comprising two kinds of sulfur-carbon composite including carbon materials having different shapes and properties as a positive electrode active material, and a lithium-sulfur battery comprising the same. The positive electrode for the lithium-sulfur battery according to the present invention exhibits low porosity and excellent surface uniformity to improve the electrochemical reactivity and stability of the positive electrode, thereby maximizing the expression of the capacity of the positive electrode, and thus enabling high capacity, high energy density, and long lifetime of the lithium-sulfur battery.