Preparation process of high-hardness scratch-resistant mobile phone touch screen
A preparation process and scratch-resistant technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of not easy to scratch-resistant, unable to achieve environmental protection effect, low hardness of mobile phone touch screen, etc. Avoid pollution, excellent transmittance, good practicability
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specific Embodiment approach 1
[0031] Specific Embodiment 1: This embodiment is a manufacturing process for a high-hardness scratch-resistant mobile phone touch screen, which includes the following steps:
[0032] Step 1, vacuum sputtering a first silicon dioxide film on the lower surface of the substrate to form a barrier layer;
[0033] The process conditions for forming the barrier layer by vacuum sputtering the first silicon dioxide film are as follows: the heating temperature of the first chamber is 70°C to 80°C, the heating temperature of the second chamber is 110°C to 120°C, and the heating temperature of the third chamber The temperature is 170°C~180°C, the heating temperature of the fourth chamber is 230°C~240°C, the heating temperature of the fifth chamber is 270°C~280°C, and the heating temperature of the sixth chamber is 290°C~300
[0034] ℃, the heating temperature of the seventh chamber and the eighth chamber is 315 ℃ ~ 325 ℃, the total heating time is 550 seconds ~ 750 seconds, the conveying ...
specific Embodiment approach 2
[0055] Embodiment 2: This embodiment differs from Embodiment 1 in that: the substrate is glass, polycarbonate PC board, acrylic board or polyethylene terephthalate PET board. Other steps are the same as in the first embodiment.
specific Embodiment approach 3
[0056] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: the organic conductive polymer is at least one of polyaniline, polythiophene, and polypyrrole. Other steps are the same as those in Embodiment 1 or 2.
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Abstract
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