An accelerated electron beam optical structure

Abstract

The invention discloses an accelerated electron beam optical structure. The accelerated electron beam optical structure comprises at least one beam optical structure, each beam optical structure comprises two opposite flanges, and electrode assemblies arranged at intervals through insulating mechanisms are placed between the two flanges; multiple mutually matched focusing regions and defocusing regions are formed on each beam optical structure in the transmission direction of electron beams in the beam optical structure by means of the electrode assemblies arranged inside, so that gathering and acceleration of to-be-transmitted electron beams are realized. According to the accelerated electron beam optical structure, electrode plates of the accelerating structures are divided into several groups, two electrode plates on the outer side of each group are manufactured to form a conical structure, a focusing and defocusing lens assembly is formed, and focusing and accelerating functions are obtained comprehensively; compared with an electrode plate accelerating structure with a common uniform distribution structure, capacity of the accelerated transmission electron beams is improved by about 20%, and regulating range of accelerating gradient is increased by about 20%.

Description

technical field [0001] The invention relates to a beam optics structure used in the case of accelerated transport of electron beams. More particularly, the present invention relates to an optical arrangement for accelerating electron beam flow for use in the case of electron beam accelerated transport. Background technique [0002] In the application of some beam optical structures, it is required that the range of the beam current of the output electron beam can be increased. Due to the existence of the space charge effect, the beam intensity of the accelerated transmission of the beam optical structure will have a limit value, exceeding this limit value, The space charge effect will cause the electron beam to diverge, the cross-sectional size of the beam spot will become larger, the quality of the beam will deteriorate, and the optical structure of the beam will be seriously damaged. [0003] In other applications, it is necessary to increase the adjustment range of the o...

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Problems solved by technology

[0005] In the prior art, by changing the voltage divider resistance, a variable gradient acceleration structure can be obtained to enhance the focusing ability. However, this method will increase the voltage on a part of the insulating ring, which may affect the high voltage performance and cause surface discharge.

[0006] Another method is to increase the focusing ability a little by changing the internal aperture of some electrode sheets, but the focusing ability is too small to meet the needs of use without significant improvement.

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