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A kind of compound electrode type pH sensor based on cmos technology and preparation method thereof

A composite electrode and pH sensor technology, which is applied in the direction of instruments, scientific instruments, and material electrochemical variables, can solve the problems of high sensor processing technology requirements, inability to use solid-state environment detection, and cumbersome testing process, etc., to achieve easy integration, The effect of improving stability and improving reliability

Active Publication Date: 2019-04-30
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The structure of the ISFET is very similar to the MOSFET without the metal gate or the polysilicon gate. The pH sensor based on the ISFET also has great research progress, such as the patent application publication number CN 103472115A ion-sensitive field-effect transistor and its preparation method, which discloses an ion-sensitive field-effect transistor and its preparation method. Sensitive field effect transistors can effectively improve the accuracy and repeatability of measurement results, but it does not involve the in-situ measurement of the pH value of the heterogeneous system and the pH sensor of the all-solid-state composite electrode and its preparation method
Currently, pH_ISFET sensors use Si 3 N 4 、Al 2 o 3 、 Ta 2 o 5 etc. as sensitive materials, such as Shi Zhaoxia and Zhu Dazhong in the design and research of pH sensor integrated circuit based on 0.6μm CMOS process, using standard CMOS process to provide Si 3 N 4 As a hydrogen ion sensitive layer, the passivation layer has good sensitivity and linearity, but it can only be measured in a solution environment
Generally, the existing sensors of this type can only be used to detect the pH value of the solution, and an external reference electrode is required. The test process is cumbersome, and the sensor processing technology is relatively high, so it cannot be used in the detection of solid-state environments.

Method used

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  • A kind of compound electrode type pH sensor based on cmos technology and preparation method thereof
  • A kind of compound electrode type pH sensor based on cmos technology and preparation method thereof
  • A kind of compound electrode type pH sensor based on cmos technology and preparation method thereof

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Embodiment 1

[0048] Such as figure 1 Shown, a kind of compound electrode type pH sensor based on CMOS technology described in the present invention, described compound electrode type pH sensor based on CMOS technology comprises substrate 1, sensing area 2, working electrode 3, electrode lead wire 4 and welding Disk 5. Wherein, the working electrode 3 is made above the sensing detection area 2, and the reference electrode 24 is located inside the sensing detection area 2; the pad 5 includes a reference electrode output terminal 51, a voltage input positive terminal 52, and a working electrode output terminal 53 And voltage input negative terminal 54.

[0049] Such as figure 2 As shown, a rectangular groove 11 is formed on the front of the base 1, and four long grooves are formed on the upper side of the rectangular groove 11, namely, long groove I12, long groove II13, long groove III14, and long groove IV15. The sensing area 2 is made on the rectangular groove 11, the electrode leads 4 ...

Embodiment 2

[0071] Such as Figure 8 As shown, the difference between the second embodiment of the compound electrode pH sensor based on the CMOS process of the present invention and the first embodiment is that the silicon substrate is an N-type silicon substrate 2002; the well region is the first The P-well region 20031 , the second P-well region 20032 and the third P-well region 20033 ; the external voltage applied to the positive voltage input terminal 52 and the negative voltage input terminal 54 is a reverse voltage.

[0072] The difference between the preparation method of the second embodiment of the present invention and the preparation method of the first embodiment lies in step S2, which is specifically: making a semiconductor substrate and a well region, and depositing an epoxy resin layer at the bottom of the rectangular groove 11 by spin coating 21. Paste the cleaned N-type silicon wafer with a length of about 18 mm, a width of about 8 mm, and a thickness of about 1 mm on th...

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Abstract

The invention provides a composite electrode type pH sensor based on a CMOS (Complementary Metal Oxide Semiconductor) process and a preparation method of the pH sensor. The sensor comprises a substrate, a sensing detection area, a working electrode, a reference electrode, an electrode lead and a bonding pad. The working electrode is arranged above the sensing detection area, and the reference electrode is positioned inside the sensing detection area. The preparation method comprises the following steps: manufacturing a substrate from an alumina ceramics material; manufacturing a semiconductor substrate and a well region; manufacturing the reference electrode; manufacturing an isolation region and an electrode oxide layer; manufacturing a metal aluminum layer; manufacturing the working electrode; manufacturing the electrode lead; and manufacturing the bonding pad. The CMOS technology is adopted, and the reference electrode is manufactured inside the device, so that reference electrode is prevented from being interfered and influenced by an outside environment, and the stability of the reference electrode is improved. The sensor has the characteristics of high stability, high sensitivity, high repeatability and the like, is easy to integrate and miniaturize and suitable for in-situ measurement of pH of a soil cultivation matrix and other heterogeneous systems, and solves the pH measurement problem in case of less moisture content.

Description

technical field [0001] The invention belongs to the application field of electrochemical sensors, in particular to a composite electrode pH sensor based on CMOS technology and a preparation method thereof, which are used to realize the original pH value of heterogeneous systems such as soil with less water content and cultivation substrates. bit measurement. Background technique [0002] Soil and cultivation substrate are a mixture of minerals and organic matter, mainly solid particles, but there are certain gases and liquids in the gaps between solid particles, which belong to a heterogeneous system. Its complex composition and heterogeneous mixed state make the soil matrix exhibit many different physical and chemical properties. In addition, because part of the soil and the matrix itself are relatively loose, it will cause poor detection contact, resulting in poor adaptability to parameter detection, low detection sensitivity, large error, and poor stability. to difficul...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N27/30
CPCG01N27/302
Inventor 耿妙妙张西良徐坤赵麟蒋薇尹利
Owner JIANGSU UNIV