Through-hole manufacturing method, display substrate manufacturing method, and display substrate
A manufacturing method and a display substrate technology, which are applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., and can solve problems such as the reduction of image display quality of display devices
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0054] In order to further illustrate the manufacturing method of the via hole, the manufacturing method of the display substrate, and the display substrate provided by the embodiments of the present invention, a detailed description will be given below in conjunction with the accompanying drawings.
[0055] see figure 1 , the manufacturing method of the via hole provided by the embodiment of the present invention includes:
[0056] Step S100 , forming a passivation protection layer on the source and drain layers.
[0057] Step S200 , forming a first via hole at a portion of the passivation protection layer corresponding to the drain of the source and drain layers.
[0058] Step S300, forming an organic insulating layer on the passivation protection layer.
[0059] Step S400, forming a second via hole at the part of the organic insulating layer corresponding to the first via hole, the second via hole exposes the drain electrode, and the diameter of the part of the second via...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com