Multi-function spectroscopic device

Abstract

The present invention relates to a multi-function spectroscopic device, the device comprising: a first lens, installed in the projecting direction of a parallel beam projected from a parallel light generation part, for focusing light of the center portion with respect to the light axis of the parallel beam; a second lens, disposed to face the first lens, for converting the light, diffused via the first lens, to parallel light; a reference mirror installed to face the second lens so as to reflect the light which has passed through the second lens; a beam splitter, installed between the first lens and the second lens, for reflecting, in a direction intersecting the light axis of the first lens, a part of the light which has passed through the first lens, and transmitting, in a direction toward the second lens, a part of the light which has passed through the first lens; a third lens for focusing the light, projected via the beam splitter, on a measurement object; a fourth lens for focusing the light reflected from the measurement object and reversely projected via the third mirror and the beam splitter; a fifth lens for converting the light, diffused via a second focus of the fourth lens, to parallel light; and a diffraction grating, disposed to be inclined with respect to the light axis of the fifth lens, for spectroscopically distributing the parallel light, projected via the fifth lens, by diffraction. Accordingly, the multi-function spectroscopic device provides an advantage of enabling film thickness, surface shape, and refractive index to be suitable for a desired measurement manner using an integrated optical system.

Description

technical field [0001] The present invention relates to multifunctional spectroscopic devices, and more particularly to multifunctional spectroscopic devices configured to support measurement of film thickness, refractive index, and surface shape. Background technique [0002] Generally, for a multilayer structure including multilayer thin films such as semiconductors, various methods are used to examine performance factors such as film thickness, surface shape, and refractive index of the film. [0003] Korean Patent No. 10-0916618 discloses a method of measuring thickness and shape using an interferometer. [0004] Meanwhile, in addition to the method using an interferometer, there are methods of analyzing the thickness and refractive index by making light incident vertically on the measurement object and detecting the intensity of light reflected from the measurement object, and by making light incident obliquely on the measurement object It is also a method of measuring...

AI Technical Summary

Problems solved by technology

[0005] However, conventional equipment for measuring film thickness, refractive index, and surface shape is independently constituted according to the above-described application manner, and thus it has not been able to provide integrated structure

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