Plate double-surface synchronous polishing device

A polishing device and plate technology, applied in polishing machine tools, grinding/polishing equipment, grinding machines, etc., can solve the problems of plate deformation, limited position limit, uneven plate polishing, etc. deformation effect

Inactive Publication Date: 2017-10-03
SUZHOU HENGDAL IND MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are also some polishing mechanisms that can simultaneously polish both sides of the plate, but the driving mechanism used to drive the double-sided polishing rollers often cannot realize the synchronous drive of the two polishing rollers, while the double-sided polishing is used to support the plate. The limit function of the bracket is limited, especially when the high-speed rotating polishing roller is used to polish the plate, the result that the polishing roller cannot be synchronized will lead to uneven polishing on both sides of the plate, and even cause deformation of the plate in severe cases

Method used

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  • Plate double-surface synchronous polishing device

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Embodiment

[0029] In order to prevent impurities from entering between the polishing head and the plate during the polishing process and destroy the polishing effect, the present invention also includes a closed casing, the plate support 1, the fixed end of the tension spring, the driving motor 3 and the mounting seat 15 (16) of the polishing mechanism are all fixed. on the closed case.

[0030] The mounting seat in the polishing mechanism is a fixed strip guide rail, the length direction of the strip guide rail is parallel to the telescopic direction of the extension spring, and the polishing machine is slidably connected to the strip guide rail. Such as figure 1 , The strip guide rail is fixed on the closed shell.

[0031] In order to facilitate the replacement of the plate to be polished, the polishing mechanism also includes a lifting drive mechanism, the lifting drive mechanism includes a telescopic rod, and the end of the telescopic rod is fixedly connected to the polishing machin...

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PUM

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Abstract

The invention discloses a plate double-surface synchronous polishing device. The plate double-surface synchronous polishing device comprises a plate fixing frame, polishing mechanisms and a synchronous driving mechanism. The number of the polishing mechanisms is two sets, and the two sets of polishing mechanisms are arranged above and below the plate fixing position of the plate fixing frame correspondingly. Each set of polishing mechanism comprises a fixedly-arranged installation base and a polishing machine slidably connected with the installation base. Each polishing machine comprises a polishing head. The polishing working surfaces of the polishing heads of the two polishing machines face the plate fixing position. The synchronous driving mechanism comprises a driving motor, a rotating shaft, transmission ropes and tension springs. An output shaft of the driving motor is fixedly connected with one end of the rotating shaft. The rotating shaft is axially perpendicular to the plate fixing plane and arranged on the side portion of the plate fixing frame. Wire wrapping wheels are fixedly arranged at the two ends of the rotating shaft correspondingly. One end of each transmission rope is connected with the corresponding wire wrapping wheel in a wrapped mode, and the other end of each transmission rope is fixedly connected with the corresponding polishing machine. One end of each tension spring is fixedly connected with the corresponding polishing machine. The length of each transmission rope connected to the corresponding wire wrapping wheel in the wrapped mode is increased, so that the corresponding tension spring is stretched. According to the plate double-surface synchronous polishing device, double-surface synchronous polishing of a plate can be achieved.

Description

technical field [0001] The invention relates to the technical field of plate processing equipment, in particular to a plate double-sided synchronous polishing device. Background technique [0002] Polishing refers to the use of mechanical, chemical or electrochemical action to reduce the surface roughness of the workpiece to obtain a bright and smooth surface. It is to use polishing tools to modify the surface of the workpiece to obtain a smooth surface or mirror luster. [0003] At present, in the polishing process of the plate, the plate is generally fixed first, then the outward side of the plate is polished, and then the plate is turned over to polish the other side. There are also some polishing mechanisms that can simultaneously polish both sides of the plate, but the driving mechanism used to drive the double-sided polishing rollers often cannot realize the synchronous drive of the two polishing rollers, while the double-sided polishing is used to support the plate. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B27/00B24B39/06
CPCB24B27/0076B24B39/06
Inventor 徐志明
Owner SUZHOU HENGDAL IND MATERIALS CO LTD
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