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A method for removing sulfate radical impurities in graphene oxide synthesis system

A synthetic system and graphene technology, applied in chemical instruments and methods, carbon compounds, inorganic chemistry, etc., can solve the problems of unfavorable industrial production, low efficiency of centrifugal washing, and extremely high requirements for centrifuge speed, and achieve a level suitable for industrial production Effect

Inactive Publication Date: 2019-03-29
BEIJING NORMAL UNIVERSITY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the low efficiency of centrifugal washing and the extremely high requirements on the speed of the centrifuge are very unfavorable for industrial production. Therefore, it is urgent to develop a simpler method for removing sulfate ions.

Method used

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  • A method for removing sulfate radical impurities in graphene oxide synthesis system
  • A method for removing sulfate radical impurities in graphene oxide synthesis system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] The improved Hummers method of embodiment 1 synthesizes graphene oxide

[0039] Weigh 3g flake graphite on weighing paper with an analytical balance and place it in a 2L beaker, weigh 360ml and 40ml concentrated sulfuric acid and phosphoric acid respectively with a graduated cylinder and add them to the graphite together. Weigh 18g of potassium permanganate in a small beaker and grind it into powder with a mortar, and slowly add it into the mixture while stirring at 0°C. The mixture was then allowed to stir at 50°C for 12 hours. After cooling to room temperature, add 400ml of ice-water mixture, stir rapidly and gradually add 3ml of 30% hydrogen peroxide. After standing for 3 days, a graphene oxide synthesis system was obtained.

Embodiment 2

[0040] Embodiment 2 adopts the sulfate radical washing liquid of calcium hydroxide solution-dichloromethane two-phase system to remove sulfate radical ion

[0041] Take 150ml of dichloromethane and add it to a 500ml beaker, add 32g of calcium hydroxide into water to make a 200ml suspension and pour it on the dichloromethane, you can see that the solution is clearly divided into upper and lower layers, and the upper layer is calcium hydroxide Suspension, the lower layer is dichloromethane. Add 50 ml of the graphene oxide synthesis system obtained in Example 1 to the junction of the two layers through a peristaltic pump without stirring. It was found that a yellow substance had sunk into the bottom layer of dichloromethane, and a white flocculent precipitate was formed in the water layer.

Embodiment 3

[0042] Example 3 XRD detection

[0043] The white flocculent precipitate in the water layer of Example 2 and the yellow substance in the bottom layer of dichloromethane were taken respectively, dried and subjected to XRD test. The results are as follows figure 1 and figure 2 shown.

[0044] from figure 1 It can be seen that the white flocculent precipitate is calcium sulfate, which proves that the sulfate radical impurity in the graphene oxide synthesis system can be removed by the method provided by the invention.

[0045] from figure 2 It can be observed that graphene oxide has a strong diffraction peak at 2θ=12.839, and the interlayer spacing is It can be seen that the interlayer spacing of oxidized graphite obviously increases, because there are a large number of water molecules and oxygen-containing functional groups such as hydroxyl, carboxyl, and epoxy groups between the oxidized graphite layers. There is a diffraction peak at 2θ=43.198, which is a graphene pla...

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Abstract

The embodiments of the present invention provide a method for removing sulfate impurities from a graphene oxide synthesis system. The method comprises: (1) synthesizing graphene oxide by using a Hummers method or an improved Hummers method to obtain a graphene oxide synthesis system; (2) ) mixing a water-immiscible organic solvent with a density of higher than water and an aqueous solution containing metal cations to obtain a sulfate scrubbing solution, wherein the sulfate scrubbing solution is separated into an upper layer water layer and a lower layer organic solvent layer, and the metal cations and the sulfate can form the precipitate; and (3) conveying the graphene oxide synthesis system obtained in the step (1) to the water layer close to the two layer boundary position in the sulfate scrubbing solution, and standing so as to make the graphene oxide in the graphene oxide synthesis system sink into the organic solvent layer. According to the present invention, the method is simple, and is suitable for industrial production.

Description

technical field [0001] The invention relates to the technical field of graphene oxide synthesis, in particular to a method for removing sulfate radical impurities in a graphene oxide synthesis system. Background technique [0002] Graphene is a single-layer carbon atomic structure composed of sp 2 The stable two-dimensional structure formed by hybridization, the hexagonal closely arranged network crystal, and the unique structure endow graphene with unique physical and chemical properties. At present, the research on graphene composite materials has involved many fields such as catalysis, luminescence, energy storage and biomedicine, and all of them have shown great application prospects. Graphene oxide (GO) is one of many derivatives of graphene, which has the characteristics of polymers, colloids, films and amphiphilic molecules. Graphene oxide is mainly composed of carbon atoms and some polar oxygen-containing functional groups (such as -OH, -COOH, C=O, -O-, etc.), and ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B32/198
CPCC01P2002/72
Inventor 杨晓晶邵百一刘盛堂
Owner BEIJING NORMAL UNIVERSITY