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A large aperture uniformity filter and its preparation method

A filter and uniformity technology, which is applied in the direction of optical filters, optics, optical components, etc., can solve the problems of reduced transmittance and high sensitivity of optical filters, shorten plating time, improve uniformity, and realize The effect of control

Active Publication Date: 2020-04-24
TIANJIN JINHANG INST OF TECH PHYSICS
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0007] The technical problem to be solved by the present invention is: due to the high sensitivity of the large-aperture narrow-band filter to the central wavelength, the slight drift of the central wavelength may lead to a decrease in the transmittance of the filter

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  • A large aperture uniformity filter and its preparation method
  • A large aperture uniformity filter and its preparation method
  • A large aperture uniformity filter and its preparation method

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Embodiment Construction

[0031] The present invention will be described in detail below in conjunction with the accompanying drawings and examples.

[0032] In order to make the purpose, content, and advantages of the present invention clearer, the specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.

[0033] The method can be used to make a double-cavity optical filter with a center wavelength of 532nm, and is also applicable to other optical filter films of any wavelength.

[0034] 1) Using fused silica with a diameter of Φ40mm and a thickness of 1mm as the substrate, the selected film material is mainly high refractive index material tantalum pentoxide (Ta 2 o 5 ) thin film and low refractive index material silicon dioxide (SiO 2 ) film, design reference wavelength λ0=532nm, unit optical thickness is 133nm.

[0035] 2) Through single-layer thin film experiments, Ta 2 o 5 Refractive inde...

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Abstract

The invention discloses a method for preparing a large-aperture uniform optical filter and belongs to the technical field of optical films. The method solves a possible transmittance decrease of the optical filter due to the slight drift of a central wavelength because of the high sensitivity of a large-aperture narrowband optical filter to the central wavelength. The method comprises plating a substrate with a half of a total film system and optically bonding the two plated films in opposite directions so as to help improve the uniformity of the large-aperture narrowband optical filter. Results show that the method contributes to the improvement of the uniformity of the large-aperture narrowband optical filter and achieves the preparation of the large-aperture uniform narrowband optical filter.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, in particular to the design and preparation technology related to the uniformity of large-diameter optical filters, and relates to a preparation method capable of improving the uniformity of large-diameter narrow-band optical filters. Background technique [0002] With the wide application of vacuum coating technology, the requirements for film uniformity are getting higher and higher. Any film with practical application value has specific requirements for film thickness distribution. Except for a few special occasions, the film thickness is required to be as uniform as possible in most cases. Film uniformity refers to the change of film thickness on the substrate to be coated with the change of the position of the substrate in the vacuum chamber. It is an important indicator to measure the quality of the film and the performance of the coating device. [0003] For only changing the c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/20G02B1/10
Inventor 陈丹刘华松姜于刚王利栓刘丹丹姜承慧季一勤
Owner TIANJIN JINHANG INST OF TECH PHYSICS
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