Laminated optical film, method for producing laminated optical film, optical member, and image display device
A manufacturing method and optical film technology, which is applied to lamination devices, optical elements, optical elements, etc., can solve the problems of increased thickness, inability to stack components sequentially, troublesome manufacturing, etc., and achieve the effect of excellent scratch resistance
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[0221] Next, examples of the present invention will be described. However, the present invention is not limited by the following examples.
[0222] Example
[0223] In this example, the laminated optical film of the present invention was produced as follows. In addition, the number of parts of the substance used for manufacture is a weight part (mass part) unless otherwise indicated. In addition, concentration (%) is weight % unless otherwise indicated.
reference example 1
[0224] [Reference Example 1: Formation of void layer]
[0225] 8 parts of methyltrimethoxysilane were dissolved in 18 parts of DMSO. 4 parts of 0.01 mol / L oxalic acid aqueous solution was added to the said liquid mixture, and it stirred at room temperature for 30 minutes, and hydrolyzed methyltrimethoxysilane. After further adding 65 parts of DMSO, 3 parts of 28% aqueous ammonia and 2 parts of pure water, it was stirred at room temperature for 15 minutes, and heated and aged at 40° C. for 20 hours to obtain a gel compound. Break the gel-like compound into granules with a size of several mm to several cm, add IPA 4 times the amount of the gel, stir gently, let stand at room temperature for 6 hours, and decant the solvent and the gel in the gel. catalyst. The same decantation treatment was repeated three times to complete the solvent replacement. This gel-like compound was subjected to high-pressure medialess pulverization (homogenizer (trade name UH-50, manufactured by SMT C...
reference example 2
[0226] [Reference Example 2: Formation of void layer]
[0227] Add 13 parts of water to 20 parts of alumina sol (4.9% concentration: manufactured by Kawaken Fine Chemicals Co., Ltd.), heat at 80°C, and then add 3 parts of NH 3 . Further, heating was performed at 80° C. for 10 hours to obtain a gel-like compound. Except having used this gel-like compound instead of the gel-like compound of Reference Example 1, it carried out similarly to Reference Example 1, and obtained the low-refractive-index void layer with a refractive index of 1.24.
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