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Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method

一种照明光学系统、检测设备的技术，应用在光学、光机械设备、半导体/固态器件制造等方向，能够解决精度降低等问题

Active Publication Date: 2018-04-17
CANON KK
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, unwanted beams may cause noise in the detection beam from the marker, and the accuracy of measuring the position of the marker may be reduced

Method used

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  • Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method
  • Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method
  • Detection device, imprint apparatus, method of manufacturing article, illumination optical system, and detection method

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Embodiment Construction

[0031] Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0032] will refer to figure 1 An imprint apparatus according to this exemplary embodiment will be described. An ultraviolet (UV) radiation curing imprint apparatus will be described as an example, in which an imprint material (resin) is to be irradiated with UV radiation to be cured. However, this exemplary embodiment can also be applied to an imprint apparatus in which the resin is irradiated with radiation in other wavelength ranges to be cured, or in which the resin is irradiated with another form of energy (for example, heat) to be cured. Cured imprint device. The imprint apparatus 100 is configured to form a pattern in a plurality of pad regions on a substrate W (wafer) by repeating an imprint process. Herein, the imprint process refers to the imprinting process on the substrate by bringing the pattern portion in the mold M into ...

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Abstract

A detection device includes an illumination optical system configured to illuminate a first alignment mark for detecting a position of an object in a first direction and a second alignment mark for detecting a position of the object in a second direction that is different from the first direction and a detection optical system configured to detect light beams from the alignment marks. The illumination optical system includes an optical element disposed at a position optically conjugate to a surface to be illuminated, and the optical element includes a region configured to form an illuminationlight beam for illuminating a first portion of the surface to be illuminated with a first angular distribution and a region configured to form an illumination light beam for illuminating a second portion that is different from the first portion of the surface to be illuminated with a second angular distribution that is different from the first angular distribution. The detection optical system isconfigured to detect a light beam from the first alignment mark in the first portion illuminated with the first angular distribution and to detect a light beam from the second alignment mark in the second portion illuminated with the second angular distribution.

Description

technical field [0001] The invention relates to a detection device, an embossing device, a method of manufacturing an article, an illumination optical system and a detection method. Background technique [0002] The imprint technique is a technique of forming a fine pattern on a substrate by shaping an imprint material coated on the substrate using a mold. For example, photocuring technology is one of such imprinting technologies. In the imprint technique using photo-curing technology, an imprint material (photo-curable resin) is first supplied to a shot as an imprint area on a substrate. The imprint material is irradiated with light in a state where the pattern in the mold is pressed on the imprint material, and the imprint material is thereby cured. The mold is released from the cured resin so that a pattern made of the resin is formed on the substrate. [0003] In order to impress the pattern in the mold onto the imprint material on the substrate, the substrate and the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B29C59/02
CPCG03F7/0002G03F9/7042G03F7/70758G03F7/70833H01L21/027B29C59/02G01D5/28G03F7/70191
Inventor 古卷贵光
Owner CANON KK
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